Effect of Ar+ beam sputtering on the magnetic anisotropy of Fe thin films deposited on the MgO(001) substrate

The Fe thin films with different initial thickness were prepared on MgO(001) substrate. Ar+ ion beam having energy of 3 keV was used to sputter the film at incident angle of 80° with respect to the film normal. Low energy electron diffraction (LEED) was employed to study the morphology and crystal q...

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Bibliographic Details
Main Authors: Syed Sheraz Ahmad, Wei He, Yong-Sheng Zhang, Jin Tang, Yan Li, Qeemat Gul, Xiang-Qun Zhang, Zhao-Hua Cheng
Format: Article
Language:English
Published: Elsevier 2017-01-01
Series:Results in Physics
Online Access:http://www.sciencedirect.com/science/article/pii/S2211379717304813

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