One-step growth of thin film SnS with large grains using MOCVD

Thin film tin sulphide (SnS) films were produced with grain sizes greater than 1 μm using a one-step metal organic chemical vapour deposition process. Tin–doped indium oxide (ITO) was used as the substrate, having a similar work function to molybdenum typically used as the back contact, but with pot...

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Bibliographic Details
Main Authors: Andrew J. Clayton, Cecile M. E. Charbonneau, Wing C. Tsoi, Peter J. Siderfin, Stuart J. C. Irvine
Format: Article
Language:English
Published: Taylor & Francis Group 2018-12-01
Series:Science and Technology of Advanced Materials
Subjects:
Online Access:http://dx.doi.org/10.1080/14686996.2018.1428478

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