Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution

Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution

A novel and simple method to improve the corrosion resistance of copper by constructing a three-dimensional (3D) 1-dodecanethiol self-assembled monolayer (SAM) in 3.5% NaCl solution is reported in this study. Several drops of 1% H3PO4 solution are thinly and uniformly distributed on copper surface t...

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Bibliographic Details
Main Authors: Shuai Hu, Zhenyu Chen, Xingpeng Guo
Format: Article
Language:English
Published: MDPI AG 2018-07-01
Series:Materials
Subjects:
copper
phosphoric acid
3D nanostructures
1-dodecanethiol SAM
Online Access:http://www.mdpi.com/1996-1944/11/7/1225
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spelling doaj-d313797f0fb34b74b20b51aff28909652020-11-24T21:35:39ZengMDPI AGMaterials1996-19442018-07-01117122510.3390/ma11071225ma11071225Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl SolutionShuai Hu0Zhenyu Chen1Xingpeng Guo2Hubei Key Laboratory of Materials Chemistry and Service Failure, School of Chemistry and Chemical Engineering, Huazhong University of Science and Technology, Wuhan 430074, ChinaHubei Key Laboratory of Materials Chemistry and Service Failure, School of Chemistry and Chemical Engineering, Huazhong University of Science and Technology, Wuhan 430074, ChinaHubei Key Laboratory of Materials Chemistry and Service Failure, School of Chemistry and Chemical Engineering, Huazhong University of Science and Technology, Wuhan 430074, ChinaA novel and simple method to improve the corrosion resistance of copper by constructing a three-dimensional (3D) 1-dodecanethiol self-assembled monolayer (SAM) in 3.5% NaCl solution is reported in this study. Several drops of 1% H3PO4 solution are thinly and uniformly distributed on copper surface to form a 3D nanostructure constituted by Cu3(PO4)2 nanoflowers. The anticorrosion properties of 1-dodecanethiol SAM on copper surface and on copper surface that is treated with H3PO4 solution were evaluated. Results demonstrated that 1-dodecanethiol SAM on bare copper surface exhibits good protection capacity, whereas a copper surface that is pretreated with H3PO4 solution can substantially enhance the corrosion resistance of 1-dodecanethiol SAM.http://www.mdpi.com/1996-1944/11/7/1225copperphosphoric acid3D nanostructures1-dodecanethiol SAM
collection DOAJ
language English
format Article
sources DOAJ
author Shuai Hu
Zhenyu Chen
Xingpeng Guo
spellingShingle Shuai Hu
Zhenyu Chen
Xingpeng Guo
Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution
Materials
copper
phosphoric acid
3D nanostructures
1-dodecanethiol SAM
author_facet Shuai Hu
Zhenyu Chen
Xingpeng Guo
author_sort Shuai Hu
title Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution
title_short Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution
title_full Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution
title_fullStr Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution
title_full_unstemmed Inhibition Effect of Three-Dimensional (3D) Nanostructures on the Corrosion Resistance of 1-Dodecanethiol Self-Assembled Monolayer on Copper in NaCl Solution
title_sort inhibition effect of three-dimensional (3d) nanostructures on the corrosion resistance of 1-dodecanethiol self-assembled monolayer on copper in nacl solution
publisher MDPI AG
series Materials
issn 1996-1944
publishDate 2018-07-01
description A novel and simple method to improve the corrosion resistance of copper by constructing a three-dimensional (3D) 1-dodecanethiol self-assembled monolayer (SAM) in 3.5% NaCl solution is reported in this study. Several drops of 1% H3PO4 solution are thinly and uniformly distributed on copper surface to form a 3D nanostructure constituted by Cu3(PO4)2 nanoflowers. The anticorrosion properties of 1-dodecanethiol SAM on copper surface and on copper surface that is treated with H3PO4 solution were evaluated. Results demonstrated that 1-dodecanethiol SAM on bare copper surface exhibits good protection capacity, whereas a copper surface that is pretreated with H3PO4 solution can substantially enhance the corrosion resistance of 1-dodecanethiol SAM.
topic copper
phosphoric acid
3D nanostructures
1-dodecanethiol SAM
url http://www.mdpi.com/1996-1944/11/7/1225
work_keys_str_mv AT shuaihu inhibitioneffectofthreedimensional3dnanostructuresonthecorrosionresistanceof1dodecanethiolselfassembledmonolayeroncopperinnaclsolution
AT zhenyuchen inhibitioneffectofthreedimensional3dnanostructuresonthecorrosionresistanceof1dodecanethiolselfassembledmonolayeroncopperinnaclsolution
AT xingpengguo inhibitioneffectofthreedimensional3dnanostructuresonthecorrosionresistanceof1dodecanethiolselfassembledmonolayeroncopperinnaclsolution
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