STED Direct Laser Writing of 45 nm Width Nanowire

STED Direct Laser Writing of 45 nm Width Nanowire

Controlled fabrication of 45 nm width nanowire using simulated emission depletion (STED) direct laser writing with a rod-shape effective focus spot is presented. In conventional STED direct laser writing, normally a donut-shaped depletion focus is used, and the minimum linewidth is restricted to 55...

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Bibliographic Details
Main Authors: Xiaolong He, Tianlong Li, Jia Zhang, Zhenlong Wang
Format: Article
Language:English
Published: MDPI AG 2019-10-01
Series:Micromachines
Subjects:
controlled fabrication
45 nm width
sted direct laser writing
rod-shape effective focus
Online Access:https://www.mdpi.com/2072-666X/10/11/726
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spelling doaj-d4c8dd4575c2404fb8c2e0e79ab76fb82020-11-25T01:15:07ZengMDPI AGMicromachines2072-666X2019-10-01101172610.3390/mi10110726mi10110726STED Direct Laser Writing of 45 nm Width NanowireXiaolong He0Tianlong Li1Jia Zhang2Zhenlong Wang3Key Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150080, ChinaKey Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150080, ChinaKey Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150080, ChinaKey Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150080, ChinaControlled fabrication of 45 nm width nanowire using simulated emission depletion (STED) direct laser writing with a rod-shape effective focus spot is presented. In conventional STED direct laser writing, normally a donut-shaped depletion focus is used, and the minimum linewidth is restricted to 55 nm. In this work, we push this limit to sub-50 nm dimension with a rod-shape effective focus spot, which is the combination of a Gaussian excitation focus and twin-oval depletion focus. Effects of photoinitiator type, excitation laser power, and depletion laser power on the width of the nanowire are explored, respectively. Single nanowire with 45 nm width is obtained, which is λ/18 of excitation wavelength and the minimum linewidth in pentaerythritol triacrylate (PETA) photoresist. Our result accelerates the progress of achievable linewidth reduction in STED direct laser writing.https://www.mdpi.com/2072-666X/10/11/726controlled fabrication45 nm widthsted direct laser writingrod-shape effective focus
collection DOAJ
language English
format Article
sources DOAJ
author Xiaolong He
Tianlong Li
Jia Zhang
Zhenlong Wang
spellingShingle Xiaolong He
Tianlong Li
Jia Zhang
Zhenlong Wang
STED Direct Laser Writing of 45 nm Width Nanowire
Micromachines
controlled fabrication
45 nm width
sted direct laser writing
rod-shape effective focus
author_facet Xiaolong He
Tianlong Li
Jia Zhang
Zhenlong Wang
author_sort Xiaolong He
title STED Direct Laser Writing of 45 nm Width Nanowire
title_short STED Direct Laser Writing of 45 nm Width Nanowire
title_full STED Direct Laser Writing of 45 nm Width Nanowire
title_fullStr STED Direct Laser Writing of 45 nm Width Nanowire
title_full_unstemmed STED Direct Laser Writing of 45 nm Width Nanowire
title_sort sted direct laser writing of 45 nm width nanowire
publisher MDPI AG
series Micromachines
issn 2072-666X
publishDate 2019-10-01
description Controlled fabrication of 45 nm width nanowire using simulated emission depletion (STED) direct laser writing with a rod-shape effective focus spot is presented. In conventional STED direct laser writing, normally a donut-shaped depletion focus is used, and the minimum linewidth is restricted to 55 nm. In this work, we push this limit to sub-50 nm dimension with a rod-shape effective focus spot, which is the combination of a Gaussian excitation focus and twin-oval depletion focus. Effects of photoinitiator type, excitation laser power, and depletion laser power on the width of the nanowire are explored, respectively. Single nanowire with 45 nm width is obtained, which is λ/18 of excitation wavelength and the minimum linewidth in pentaerythritol triacrylate (PETA) photoresist. Our result accelerates the progress of achievable linewidth reduction in STED direct laser writing.
topic controlled fabrication
45 nm width
sted direct laser writing
rod-shape effective focus
url https://www.mdpi.com/2072-666X/10/11/726
work_keys_str_mv AT xiaolonghe steddirectlaserwritingof45nmwidthnanowire
AT tianlongli steddirectlaserwritingof45nmwidthnanowire
AT jiazhang steddirectlaserwritingof45nmwidthnanowire
AT zhenlongwang steddirectlaserwritingof45nmwidthnanowire
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