STED Direct Laser Writing of 45 nm Width Nanowire
Controlled fabrication of 45 nm width nanowire using simulated emission depletion (STED) direct laser writing with a rod-shape effective focus spot is presented. In conventional STED direct laser writing, normally a donut-shaped depletion focus is used, and the minimum linewidth is restricted to 55...
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2019-10-01
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Online Access: | https://www.mdpi.com/2072-666X/10/11/726 |
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doaj-d4c8dd4575c2404fb8c2e0e79ab76fb82020-11-25T01:15:07ZengMDPI AGMicromachines2072-666X2019-10-01101172610.3390/mi10110726mi10110726STED Direct Laser Writing of 45 nm Width NanowireXiaolong He0Tianlong Li1Jia Zhang2Zhenlong Wang3Key Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150080, ChinaKey Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150080, ChinaKey Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150080, ChinaKey Laboratory of Micro-systems and Micro-structures Manufacturing, Ministry of Education, Harbin Institute of Technology, Harbin 150080, ChinaControlled fabrication of 45 nm width nanowire using simulated emission depletion (STED) direct laser writing with a rod-shape effective focus spot is presented. In conventional STED direct laser writing, normally a donut-shaped depletion focus is used, and the minimum linewidth is restricted to 55 nm. In this work, we push this limit to sub-50 nm dimension with a rod-shape effective focus spot, which is the combination of a Gaussian excitation focus and twin-oval depletion focus. Effects of photoinitiator type, excitation laser power, and depletion laser power on the width of the nanowire are explored, respectively. Single nanowire with 45 nm width is obtained, which is λ/18 of excitation wavelength and the minimum linewidth in pentaerythritol triacrylate (PETA) photoresist. Our result accelerates the progress of achievable linewidth reduction in STED direct laser writing.https://www.mdpi.com/2072-666X/10/11/726controlled fabrication45 nm widthsted direct laser writingrod-shape effective focus |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Xiaolong He Tianlong Li Jia Zhang Zhenlong Wang |
spellingShingle |
Xiaolong He Tianlong Li Jia Zhang Zhenlong Wang STED Direct Laser Writing of 45 nm Width Nanowire Micromachines controlled fabrication 45 nm width sted direct laser writing rod-shape effective focus |
author_facet |
Xiaolong He Tianlong Li Jia Zhang Zhenlong Wang |
author_sort |
Xiaolong He |
title |
STED Direct Laser Writing of 45 nm Width Nanowire |
title_short |
STED Direct Laser Writing of 45 nm Width Nanowire |
title_full |
STED Direct Laser Writing of 45 nm Width Nanowire |
title_fullStr |
STED Direct Laser Writing of 45 nm Width Nanowire |
title_full_unstemmed |
STED Direct Laser Writing of 45 nm Width Nanowire |
title_sort |
sted direct laser writing of 45 nm width nanowire |
publisher |
MDPI AG |
series |
Micromachines |
issn |
2072-666X |
publishDate |
2019-10-01 |
description |
Controlled fabrication of 45 nm width nanowire using simulated emission depletion (STED) direct laser writing with a rod-shape effective focus spot is presented. In conventional STED direct laser writing, normally a donut-shaped depletion focus is used, and the minimum linewidth is restricted to 55 nm. In this work, we push this limit to sub-50 nm dimension with a rod-shape effective focus spot, which is the combination of a Gaussian excitation focus and twin-oval depletion focus. Effects of photoinitiator type, excitation laser power, and depletion laser power on the width of the nanowire are explored, respectively. Single nanowire with 45 nm width is obtained, which is λ/18 of excitation wavelength and the minimum linewidth in pentaerythritol triacrylate (PETA) photoresist. Our result accelerates the progress of achievable linewidth reduction in STED direct laser writing. |
topic |
controlled fabrication 45 nm width sted direct laser writing rod-shape effective focus |
url |
https://www.mdpi.com/2072-666X/10/11/726 |
work_keys_str_mv |
AT xiaolonghe steddirectlaserwritingof45nmwidthnanowire AT tianlongli steddirectlaserwritingof45nmwidthnanowire AT jiazhang steddirectlaserwritingof45nmwidthnanowire AT zhenlongwang steddirectlaserwritingof45nmwidthnanowire |
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1725154364892381184 |