Low-loss slot waveguides with silicon (111) surfaces realized using anisotropic wet etching

We demonstrate low-loss slot waveguides on silicon-on-insulator (SOI) platform. Waveguides oriented along the (11-2) direction on the Si (110) plane were first fabricated by a standard e-beam lithography and dry etching process. A TMAH based anisotropic wet etching technique was then used to remove...

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Bibliographic Details
Main Authors: Kapil Debnath, Ali Z Khokhar, Stuart A Boden, Hideo Arimoto, Swe Zin Oo, Harold M H Chong, Graham Trevor Reed, Shinichi Saito
Format: Article
Language:English
Published: Frontiers Media S.A. 2016-11-01
Series:Frontiers in Materials
Subjects:
Online Access:http://journal.frontiersin.org/Journal/10.3389/fmats.2016.00051/full
Description
Summary:We demonstrate low-loss slot waveguides on silicon-on-insulator (SOI) platform. Waveguides oriented along the (11-2) direction on the Si (110) plane were first fabricated by a standard e-beam lithography and dry etching process. A TMAH based anisotropic wet etching technique was then used to remove any residual side wall roughness. Using this fabrication technique propagation loss as low as 3.7dB/cm was realized in silicon slot waveguide for wavelengths near 1550nm. We also realized low propagation loss of 1dB/cm for silicon strip waveguides.
ISSN:2296-8016