Chemical Vapour Deposition of Hexagonal Boron Nitride for Two Dimensional Electronics

Hexagonal boron nitride (h-BN) has potential applications in protective coatings, single photon emitters and as substrate for graphene electronics. In this paper, we report on the growth of h-BN by chemical vapor deposition (CVD) using ammonia borane as the precursor. Use of CVD allows controlled sy...

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Main Authors: Balaji Sompalle, Jérôme Borme, Fátima Cerqueira, Tangyou Sun, Rui Campos, Pedro Alpuim
Format: Article
Language:English
Published: Universidade do Porto 2017-11-01
Series:U.Porto Journal of Engineering
Subjects:
Online Access:https://journalengineering.fe.up.pt/article/view/92
id doaj-da8307c5330c4b0794919bdb59618ef9
record_format Article
spelling doaj-da8307c5330c4b0794919bdb59618ef92020-11-24T21:32:28ZengUniversidade do PortoU.Porto Journal of Engineering2183-64932017-11-0133273410.24840/2183-6493_003.003_000392Chemical Vapour Deposition of Hexagonal Boron Nitride for Two Dimensional ElectronicsBalaji Sompalle0Jérôme Borme1Fátima Cerqueira2Tangyou Sun3Rui Campos4Pedro Alpuim5Universidade do Minho; INLINLUniversidade do Minho; INLUniversidade do Minho; INLUniversidade do Minho; INLUniversidade do Minho; INLHexagonal boron nitride (h-BN) has potential applications in protective coatings, single photon emitters and as substrate for graphene electronics. In this paper, we report on the growth of h-BN by chemical vapor deposition (CVD) using ammonia borane as the precursor. Use of CVD allows controlled synthesis over large areas defined by process parameters, e.g. temperature, time, process chamber pressure and gas partial pressures. Furthermore, independently grown graphene and h-BN layers are put together to realize enhancement in electronic properties of graphene.https://journalengineering.fe.up.pt/article/view/92Hexagonal Boron NitrideChemical Vapor DepositionAmmonia boraneGraphene Electronics
collection DOAJ
language English
format Article
sources DOAJ
author Balaji Sompalle
Jérôme Borme
Fátima Cerqueira
Tangyou Sun
Rui Campos
Pedro Alpuim
spellingShingle Balaji Sompalle
Jérôme Borme
Fátima Cerqueira
Tangyou Sun
Rui Campos
Pedro Alpuim
Chemical Vapour Deposition of Hexagonal Boron Nitride for Two Dimensional Electronics
U.Porto Journal of Engineering
Hexagonal Boron Nitride
Chemical Vapor Deposition
Ammonia borane
Graphene Electronics
author_facet Balaji Sompalle
Jérôme Borme
Fátima Cerqueira
Tangyou Sun
Rui Campos
Pedro Alpuim
author_sort Balaji Sompalle
title Chemical Vapour Deposition of Hexagonal Boron Nitride for Two Dimensional Electronics
title_short Chemical Vapour Deposition of Hexagonal Boron Nitride for Two Dimensional Electronics
title_full Chemical Vapour Deposition of Hexagonal Boron Nitride for Two Dimensional Electronics
title_fullStr Chemical Vapour Deposition of Hexagonal Boron Nitride for Two Dimensional Electronics
title_full_unstemmed Chemical Vapour Deposition of Hexagonal Boron Nitride for Two Dimensional Electronics
title_sort chemical vapour deposition of hexagonal boron nitride for two dimensional electronics
publisher Universidade do Porto
series U.Porto Journal of Engineering
issn 2183-6493
publishDate 2017-11-01
description Hexagonal boron nitride (h-BN) has potential applications in protective coatings, single photon emitters and as substrate for graphene electronics. In this paper, we report on the growth of h-BN by chemical vapor deposition (CVD) using ammonia borane as the precursor. Use of CVD allows controlled synthesis over large areas defined by process parameters, e.g. temperature, time, process chamber pressure and gas partial pressures. Furthermore, independently grown graphene and h-BN layers are put together to realize enhancement in electronic properties of graphene.
topic Hexagonal Boron Nitride
Chemical Vapor Deposition
Ammonia borane
Graphene Electronics
url https://journalengineering.fe.up.pt/article/view/92
work_keys_str_mv AT balajisompalle chemicalvapourdepositionofhexagonalboronnitridefortwodimensionalelectronics
AT jeromeborme chemicalvapourdepositionofhexagonalboronnitridefortwodimensionalelectronics
AT fatimacerqueira chemicalvapourdepositionofhexagonalboronnitridefortwodimensionalelectronics
AT tangyousun chemicalvapourdepositionofhexagonalboronnitridefortwodimensionalelectronics
AT ruicampos chemicalvapourdepositionofhexagonalboronnitridefortwodimensionalelectronics
AT pedroalpuim chemicalvapourdepositionofhexagonalboronnitridefortwodimensionalelectronics
_version_ 1725957466793967616