Electro-Thermal Simulation of Vertical VO<sub>2</sub> Thermal-Electronic Circuit Elements
Advancement of classical silicon-based circuit technology is approaching maturity and saturation. The worldwide research is now focusing wide range of potential technologies for the “More than Moore” era. One of these technologies is thermal-electronic logic circuits based on the semiconductor-to-me...
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doaj-df2ce526c158457c89e2a62cf10ae00c2020-11-25T03:24:22ZengMDPI AGEnergies1996-10732020-07-01133447344710.3390/en13133447Electro-Thermal Simulation of Vertical VO<sub>2</sub> Thermal-Electronic Circuit ElementsMahmoud Darwish0Péter Neumann1János Mizsei2László Pohl3Department of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, HungaryDepartment of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, HungaryDepartment of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, HungaryDepartment of Electron Devices, Budapest University of Technology and Economics, 1117 Budapest, HungaryAdvancement of classical silicon-based circuit technology is approaching maturity and saturation. The worldwide research is now focusing wide range of potential technologies for the “More than Moore” era. One of these technologies is thermal-electronic logic circuits based on the semiconductor-to-metal phase transition of vanadium dioxide, a possible future logic circuits to replace the conventional circuits. In thermal-electronic circuits, information flows in a combination of thermal and electronic signals. Design of these circuits will be possible once appropriate device models become available. Characteristics of vanadium dioxide are under research by preparing structures in laboratory and their validation by simulation models. Modeling and simulation of these devices is challenging due to several nonlinearities, discussed in this article. Introduction of custom finite volumes method simulator has however improved handling of special properties of vanadium dioxide. This paper presents modeling and electro-thermal simulation of vertically structured devices of different dimensions, 10<inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">n</mi> </semantics> </math> </inline-formula><inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">m</mi> </semantics> </math> </inline-formula> to 300<inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">n</mi> </semantics> </math> </inline-formula><inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">m</mi> </semantics> </math> </inline-formula> layer thicknesses and 200<inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">n</mi> </semantics> </math> </inline-formula><inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">m</mi> </semantics> </math> </inline-formula> to 30<inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">m</mi> </semantics> </math> </inline-formula> radii. Results of this research will facilitate determination of sample sizes in the next phase of device modeling.https://www.mdpi.com/1996-1073/13/13/3447beyond CMOSVO<sub>2</sub>thermal-electronic circuitselectro-thermal simulationvertical structure |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Mahmoud Darwish Péter Neumann János Mizsei László Pohl |
spellingShingle |
Mahmoud Darwish Péter Neumann János Mizsei László Pohl Electro-Thermal Simulation of Vertical VO<sub>2</sub> Thermal-Electronic Circuit Elements Energies beyond CMOS VO<sub>2</sub> thermal-electronic circuits electro-thermal simulation vertical structure |
author_facet |
Mahmoud Darwish Péter Neumann János Mizsei László Pohl |
author_sort |
Mahmoud Darwish |
title |
Electro-Thermal Simulation of Vertical VO<sub>2</sub> Thermal-Electronic Circuit Elements |
title_short |
Electro-Thermal Simulation of Vertical VO<sub>2</sub> Thermal-Electronic Circuit Elements |
title_full |
Electro-Thermal Simulation of Vertical VO<sub>2</sub> Thermal-Electronic Circuit Elements |
title_fullStr |
Electro-Thermal Simulation of Vertical VO<sub>2</sub> Thermal-Electronic Circuit Elements |
title_full_unstemmed |
Electro-Thermal Simulation of Vertical VO<sub>2</sub> Thermal-Electronic Circuit Elements |
title_sort |
electro-thermal simulation of vertical vo<sub>2</sub> thermal-electronic circuit elements |
publisher |
MDPI AG |
series |
Energies |
issn |
1996-1073 |
publishDate |
2020-07-01 |
description |
Advancement of classical silicon-based circuit technology is approaching maturity and saturation. The worldwide research is now focusing wide range of potential technologies for the “More than Moore” era. One of these technologies is thermal-electronic logic circuits based on the semiconductor-to-metal phase transition of vanadium dioxide, a possible future logic circuits to replace the conventional circuits. In thermal-electronic circuits, information flows in a combination of thermal and electronic signals. Design of these circuits will be possible once appropriate device models become available. Characteristics of vanadium dioxide are under research by preparing structures in laboratory and their validation by simulation models. Modeling and simulation of these devices is challenging due to several nonlinearities, discussed in this article. Introduction of custom finite volumes method simulator has however improved handling of special properties of vanadium dioxide. This paper presents modeling and electro-thermal simulation of vertically structured devices of different dimensions, 10<inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">n</mi> </semantics> </math> </inline-formula><inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">m</mi> </semantics> </math> </inline-formula> to 300<inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">n</mi> </semantics> </math> </inline-formula><inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">m</mi> </semantics> </math> </inline-formula> layer thicknesses and 200<inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">n</mi> </semantics> </math> </inline-formula><inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">m</mi> </semantics> </math> </inline-formula> to 30<inline-formula> <math display="inline"> <semantics> <mi mathvariant="normal">m</mi> </semantics> </math> </inline-formula> radii. Results of this research will facilitate determination of sample sizes in the next phase of device modeling. |
topic |
beyond CMOS VO<sub>2</sub> thermal-electronic circuits electro-thermal simulation vertical structure |
url |
https://www.mdpi.com/1996-1073/13/13/3447 |
work_keys_str_mv |
AT mahmouddarwish electrothermalsimulationofverticalvosub2subthermalelectroniccircuitelements AT peterneumann electrothermalsimulationofverticalvosub2subthermalelectroniccircuitelements AT janosmizsei electrothermalsimulationofverticalvosub2subthermalelectroniccircuitelements AT laszlopohl electrothermalsimulationofverticalvosub2subthermalelectroniccircuitelements |
_version_ |
1724601959563919360 |