Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

Tailoring the soft magnetic properties of sputtered multilayers by microstructure engineering for high frequency applications

Soft magnetic Ni78.5Fe21.5, Co91.5Ta4.5Zr4 and Fe52Co28B20 thin films laminated with SiO2, Al2O3, AlN, and Ta2O5 dielectric interlayers were deposited on 8” Si wafers using DC, pulsed DC and RF cathodes in the industrial, high-throughput Evatec LLS-EVO-II magnetron sputtering system. A typical multi...

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Bibliographic Details
Main Authors: Claudiu V. Falub, Hartmut Rohrmann, Martin Bless, Mojmír Meduňa, Miguel Marioni, Daniel Schneider, Jan H. Richter, Marco Padrun
Format: Article
Language:English
Published: AIP Publishing LLC 2017-05-01
Series:AIP Advances
Online Access:http://dx.doi.org/10.1063/1.4973945

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