A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array

A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array

A new method to fabricate the multiwavelength DFB semiconductor laser array (MLA) is proposed for the first time based on sampled grating and s-bent waveguide. According to the detailed precision analysis, the lasing wavelength accuracy of the proposed structure is significantly improved. Because th...

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Bibliographic Details
Main Authors: Yuechun Shi, Rui Liu, Shengchun Liu, Xiaojun Zhu
Format: Article
Language:English
Published: IEEE 2014-01-01
Series:IEEE Photonics Journal
Subjects:
Sampled grating
bent waveguide
DFB laser
laser array
Online Access:https://ieeexplore.ieee.org/document/6798654/
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spelling doaj-e8321ace501a49619d8cfc28d680ea072021-03-29T17:18:40ZengIEEEIEEE Photonics Journal1943-06552014-01-016311210.1109/JPHOT.2014.23176746798654A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser ArrayYuechun Shi0Rui Liu1Shengchun Liu2Xiaojun Zhu3<formula formulatype="inline"><tex Notation="TeX">$^{1}$</tex></formula> National Laboratory of Solid State Microstructures, Microwave-Photonics Technology Laboratory, College of Engineering and Applied Sciences, Nanjing University, Nanjing, ChinaNational Laboratory of Solid State Microstructures, Microwave-Photonics Technology Laboratory, College of Engineering and Applied Sciences, Nanjing University, Nanjing, China<formula formulatype="inline"><tex Notation="TeX">$^{1}$</tex></formula>National Laboratory of Solid State Microstructures, Microwave-Photonics Technology Laboratory, College of Engineering, and Applied Sciences, Nanjing University, Nanjing, China<formula formulatype="inline"><tex Notation="TeX">$^{3}$</tex></formula>The School of Electronic and Information, Nantong University, Nantong, ChinaA new method to fabricate the multiwavelength DFB semiconductor laser array (MLA) is proposed for the first time based on sampled grating and s-bent waveguide. According to the detailed precision analysis, the lasing wavelength accuracy of the proposed structure is significantly improved. Because the common holography exposure and micrometer photolithography are used to fabricate the sampled grating and the bent waveguide in this method, the fabrication cost is very low. Therefore, it offers a suitable method for massive fabrication.https://ieeexplore.ieee.org/document/6798654/Sampled gratingbent waveguideDFB laserlaser array
collection DOAJ
language English
format Article
sources DOAJ
author Yuechun Shi
Rui Liu
Shengchun Liu
Xiaojun Zhu
spellingShingle Yuechun Shi
Rui Liu
Shengchun Liu
Xiaojun Zhu
A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array
IEEE Photonics Journal
Sampled grating
bent waveguide
DFB laser
laser array
author_facet Yuechun Shi
Rui Liu
Shengchun Liu
Xiaojun Zhu
author_sort Yuechun Shi
title A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array
title_short A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array
title_full A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array
title_fullStr A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array
title_full_unstemmed A Low-Cost and High-Wavelength-Precision Fabrication Method for Multiwavelength DFB Semiconductor Laser Array
title_sort low-cost and high-wavelength-precision fabrication method for multiwavelength dfb semiconductor laser array
publisher IEEE
series IEEE Photonics Journal
issn 1943-0655
publishDate 2014-01-01
description A new method to fabricate the multiwavelength DFB semiconductor laser array (MLA) is proposed for the first time based on sampled grating and s-bent waveguide. According to the detailed precision analysis, the lasing wavelength accuracy of the proposed structure is significantly improved. Because the common holography exposure and micrometer photolithography are used to fabricate the sampled grating and the bent waveguide in this method, the fabrication cost is very low. Therefore, it offers a suitable method for massive fabrication.
topic Sampled grating
bent waveguide
DFB laser
laser array
url https://ieeexplore.ieee.org/document/6798654/
work_keys_str_mv AT yuechunshi alowcostandhighwavelengthprecisionfabricationmethodformultiwavelengthdfbsemiconductorlaserarray
AT ruiliu alowcostandhighwavelengthprecisionfabricationmethodformultiwavelengthdfbsemiconductorlaserarray
AT shengchunliu alowcostandhighwavelengthprecisionfabricationmethodformultiwavelengthdfbsemiconductorlaserarray
AT xiaojunzhu alowcostandhighwavelengthprecisionfabricationmethodformultiwavelengthdfbsemiconductorlaserarray
AT yuechunshi lowcostandhighwavelengthprecisionfabricationmethodformultiwavelengthdfbsemiconductorlaserarray
AT ruiliu lowcostandhighwavelengthprecisionfabricationmethodformultiwavelengthdfbsemiconductorlaserarray
AT shengchunliu lowcostandhighwavelengthprecisionfabricationmethodformultiwavelengthdfbsemiconductorlaserarray
AT xiaojunzhu lowcostandhighwavelengthprecisionfabricationmethodformultiwavelengthdfbsemiconductorlaserarray
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