Semi-insulating GaAs surface modifications and their influence in the response of THz devices
In this work, we use the Metal-Assisted Chemical Etching (MACE) technique together with an NH3 plasma treatment using a Remote Plasma-Enhanced Chemical Vapor Deposition (RPECVD) equipment to modify the surface of semi-insulating GaAs (SI-GaAs) substrates. Using our modified SI-GaAs, we fabricate pho...
Main Authors: | , , , , , |
---|---|
Format: | Article |
Language: | English |
Published: |
Elsevier
2021-05-01
|
Series: | Results in Physics |
Subjects: | |
Online Access: | http://www.sciencedirect.com/science/article/pii/S2211379721002527 |
id |
doaj-e9dd685a518d4b5b8d58f6bc5c70def4 |
---|---|
record_format |
Article |
spelling |
doaj-e9dd685a518d4b5b8d58f6bc5c70def42021-05-06T04:23:32ZengElsevierResults in Physics2211-37972021-05-0124104095Semi-insulating GaAs surface modifications and their influence in the response of THz devicesA.L. Muñoz-Rosas0N. Qureshi1G. Paz-Martínez2C.G. Treviño-Palacios3J.C. Alonso-Huitrón4A. Rodríguez-Gómez5Instituto de Física, Universidad Nacional Autónoma de México, Circuito de la Investigación Científica s/n, Ciudad Universitaria, A.P. 20-364, Coyoacán 04510, Ciudad de México, MexicoInstituto de Ciencias Aplicadas y Tecnología, Universidad Nacional Autónoma de México, A.P.70-180, Ciudad de México 04510, MexicoUniversidad de Salamanca, departamento de Física Aplicada, Plaza de la Merced s/n, 37008, Salamanca, EspañaInstituto Nacional de Astrofísica, Óptica y Electrónica Luis Enrique Erro 1, Sta. Ma. Tonantzintla, Puebla Pue 72840, MexicoInstituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Ciudad Universitaria, A.P. 70-360, Coyoacán 04510, Ciudad de México, MexicoInstituto de Física, Universidad Nacional Autónoma de México, Circuito de la Investigación Científica s/n, Ciudad Universitaria, A.P. 20-364, Coyoacán 04510, Ciudad de México, Mexico; Corresponding author.In this work, we use the Metal-Assisted Chemical Etching (MACE) technique together with an NH3 plasma treatment using a Remote Plasma-Enhanced Chemical Vapor Deposition (RPECVD) equipment to modify the surface of semi-insulating GaAs (SI-GaAs) substrates. Using our modified SI-GaAs, we fabricate photoconductive antennas for THz emission to study the modification's influence on the optical and electrical antenna response. We found substantial gaps in the frequency-domain spectra of the devices, whose origin could reside in a change of the substrate's optical absorption due to: (a) a surficial chemical change or (b) a substrate topographic modification or a combination of both. We showed experimentally that slight and reproducible substrate surface modifications could lead to significant variations in the electrical behavior and THz response of SI-GaAs devices.http://www.sciencedirect.com/science/article/pii/S2211379721002527MACE techniqueGaAs nanostructurationPhotoconductive antennasTHz emission |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
A.L. Muñoz-Rosas N. Qureshi G. Paz-Martínez C.G. Treviño-Palacios J.C. Alonso-Huitrón A. Rodríguez-Gómez |
spellingShingle |
A.L. Muñoz-Rosas N. Qureshi G. Paz-Martínez C.G. Treviño-Palacios J.C. Alonso-Huitrón A. Rodríguez-Gómez Semi-insulating GaAs surface modifications and their influence in the response of THz devices Results in Physics MACE technique GaAs nanostructuration Photoconductive antennas THz emission |
author_facet |
A.L. Muñoz-Rosas N. Qureshi G. Paz-Martínez C.G. Treviño-Palacios J.C. Alonso-Huitrón A. Rodríguez-Gómez |
author_sort |
A.L. Muñoz-Rosas |
title |
Semi-insulating GaAs surface modifications and their influence in the response of THz devices |
title_short |
Semi-insulating GaAs surface modifications and their influence in the response of THz devices |
title_full |
Semi-insulating GaAs surface modifications and their influence in the response of THz devices |
title_fullStr |
Semi-insulating GaAs surface modifications and their influence in the response of THz devices |
title_full_unstemmed |
Semi-insulating GaAs surface modifications and their influence in the response of THz devices |
title_sort |
semi-insulating gaas surface modifications and their influence in the response of thz devices |
publisher |
Elsevier |
series |
Results in Physics |
issn |
2211-3797 |
publishDate |
2021-05-01 |
description |
In this work, we use the Metal-Assisted Chemical Etching (MACE) technique together with an NH3 plasma treatment using a Remote Plasma-Enhanced Chemical Vapor Deposition (RPECVD) equipment to modify the surface of semi-insulating GaAs (SI-GaAs) substrates. Using our modified SI-GaAs, we fabricate photoconductive antennas for THz emission to study the modification's influence on the optical and electrical antenna response. We found substantial gaps in the frequency-domain spectra of the devices, whose origin could reside in a change of the substrate's optical absorption due to: (a) a surficial chemical change or (b) a substrate topographic modification or a combination of both. We showed experimentally that slight and reproducible substrate surface modifications could lead to significant variations in the electrical behavior and THz response of SI-GaAs devices. |
topic |
MACE technique GaAs nanostructuration Photoconductive antennas THz emission |
url |
http://www.sciencedirect.com/science/article/pii/S2211379721002527 |
work_keys_str_mv |
AT almunozrosas semiinsulatinggaassurfacemodificationsandtheirinfluenceintheresponseofthzdevices AT nqureshi semiinsulatinggaassurfacemodificationsandtheirinfluenceintheresponseofthzdevices AT gpazmartinez semiinsulatinggaassurfacemodificationsandtheirinfluenceintheresponseofthzdevices AT cgtrevinopalacios semiinsulatinggaassurfacemodificationsandtheirinfluenceintheresponseofthzdevices AT jcalonsohuitron semiinsulatinggaassurfacemodificationsandtheirinfluenceintheresponseofthzdevices AT arodriguezgomez semiinsulatinggaassurfacemodificationsandtheirinfluenceintheresponseofthzdevices |
_version_ |
1721457337264242688 |