Semi-insulating GaAs surface modifications and their influence in the response of THz devices

In this work, we use the Metal-Assisted Chemical Etching (MACE) technique together with an NH3 plasma treatment using a Remote Plasma-Enhanced Chemical Vapor Deposition (RPECVD) equipment to modify the surface of semi-insulating GaAs (SI-GaAs) substrates. Using our modified SI-GaAs, we fabricate pho...

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Main Authors: A.L. Muñoz-Rosas, N. Qureshi, G. Paz-Martínez, C.G. Treviño-Palacios, J.C. Alonso-Huitrón, A. Rodríguez-Gómez
Format: Article
Language:English
Published: Elsevier 2021-05-01
Series:Results in Physics
Subjects:
Online Access:http://www.sciencedirect.com/science/article/pii/S2211379721002527
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spelling doaj-e9dd685a518d4b5b8d58f6bc5c70def42021-05-06T04:23:32ZengElsevierResults in Physics2211-37972021-05-0124104095Semi-insulating GaAs surface modifications and their influence in the response of THz devicesA.L. Muñoz-Rosas0N. Qureshi1G. Paz-Martínez2C.G. Treviño-Palacios3J.C. Alonso-Huitrón4A. Rodríguez-Gómez5Instituto de Física, Universidad Nacional Autónoma de México, Circuito de la Investigación Científica s/n, Ciudad Universitaria, A.P. 20-364, Coyoacán 04510, Ciudad de México, MexicoInstituto de Ciencias Aplicadas y Tecnología, Universidad Nacional Autónoma de México, A.P.70-180, Ciudad de México 04510, MexicoUniversidad de Salamanca, departamento de Física Aplicada, Plaza de la Merced s/n, 37008, Salamanca, EspañaInstituto Nacional de Astrofísica, Óptica y Electrónica Luis Enrique Erro 1, Sta. Ma. Tonantzintla, Puebla Pue 72840, MexicoInstituto de Investigaciones en Materiales, Universidad Nacional Autónoma de México, Ciudad Universitaria, A.P. 70-360, Coyoacán 04510, Ciudad de México, MexicoInstituto de Física, Universidad Nacional Autónoma de México, Circuito de la Investigación Científica s/n, Ciudad Universitaria, A.P. 20-364, Coyoacán 04510, Ciudad de México, Mexico; Corresponding author.In this work, we use the Metal-Assisted Chemical Etching (MACE) technique together with an NH3 plasma treatment using a Remote Plasma-Enhanced Chemical Vapor Deposition (RPECVD) equipment to modify the surface of semi-insulating GaAs (SI-GaAs) substrates. Using our modified SI-GaAs, we fabricate photoconductive antennas for THz emission to study the modification's influence on the optical and electrical antenna response. We found substantial gaps in the frequency-domain spectra of the devices, whose origin could reside in a change of the substrate's optical absorption due to: (a) a surficial chemical change or (b) a substrate topographic modification or a combination of both. We showed experimentally that slight and reproducible substrate surface modifications could lead to significant variations in the electrical behavior and THz response of SI-GaAs devices.http://www.sciencedirect.com/science/article/pii/S2211379721002527MACE techniqueGaAs nanostructurationPhotoconductive antennasTHz emission
collection DOAJ
language English
format Article
sources DOAJ
author A.L. Muñoz-Rosas
N. Qureshi
G. Paz-Martínez
C.G. Treviño-Palacios
J.C. Alonso-Huitrón
A. Rodríguez-Gómez
spellingShingle A.L. Muñoz-Rosas
N. Qureshi
G. Paz-Martínez
C.G. Treviño-Palacios
J.C. Alonso-Huitrón
A. Rodríguez-Gómez
Semi-insulating GaAs surface modifications and their influence in the response of THz devices
Results in Physics
MACE technique
GaAs nanostructuration
Photoconductive antennas
THz emission
author_facet A.L. Muñoz-Rosas
N. Qureshi
G. Paz-Martínez
C.G. Treviño-Palacios
J.C. Alonso-Huitrón
A. Rodríguez-Gómez
author_sort A.L. Muñoz-Rosas
title Semi-insulating GaAs surface modifications and their influence in the response of THz devices
title_short Semi-insulating GaAs surface modifications and their influence in the response of THz devices
title_full Semi-insulating GaAs surface modifications and their influence in the response of THz devices
title_fullStr Semi-insulating GaAs surface modifications and their influence in the response of THz devices
title_full_unstemmed Semi-insulating GaAs surface modifications and their influence in the response of THz devices
title_sort semi-insulating gaas surface modifications and their influence in the response of thz devices
publisher Elsevier
series Results in Physics
issn 2211-3797
publishDate 2021-05-01
description In this work, we use the Metal-Assisted Chemical Etching (MACE) technique together with an NH3 plasma treatment using a Remote Plasma-Enhanced Chemical Vapor Deposition (RPECVD) equipment to modify the surface of semi-insulating GaAs (SI-GaAs) substrates. Using our modified SI-GaAs, we fabricate photoconductive antennas for THz emission to study the modification's influence on the optical and electrical antenna response. We found substantial gaps in the frequency-domain spectra of the devices, whose origin could reside in a change of the substrate's optical absorption due to: (a) a surficial chemical change or (b) a substrate topographic modification or a combination of both. We showed experimentally that slight and reproducible substrate surface modifications could lead to significant variations in the electrical behavior and THz response of SI-GaAs devices.
topic MACE technique
GaAs nanostructuration
Photoconductive antennas
THz emission
url http://www.sciencedirect.com/science/article/pii/S2211379721002527
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