Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption
Abstract Microwave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, beca...
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doaj-ee28a9b9084f4ee699862156407c6b752021-06-20T11:32:42ZengNature Publishing GroupScientific Reports2045-23222021-06-0111111210.1038/s41598-021-91868-yFabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorptionJi-Young Jeong0Je-Ryung Lee1Hyeonjin Park2Joonkyo Jung3Doo-Sun Choi4Eun-chae Jeon5Jonghwa Shin6Jun Sae Han7Tae-Jin Je8Department of Nano Mechatronics Engineering, University of Science and Technology (UST)Advanced Cutting Tools Research Team, Daegu Mechatronics and Materials Institute (DMI)Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST)Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST)Department of Nano Manufacturing Technology, Korea Institute of Machinery and Materials (KIMM)School of Materials Science and Engineering, University of UlsanDepartment of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST)Department of Nano Mechatronics Engineering, University of Science and Technology (UST)Department of Nano Mechatronics Engineering, University of Science and Technology (UST)Abstract Microwave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, because the printing process deposits materials at the same height over the entire surface of substrate. In this study, a promising manufacturing process was suggested for engraved resistive double square loop arrays with ultra-wide bandwidth microwave. The developed manufacturing process consists of a micro-end-milling, inking, and planing processes. A 144-number of double square loop array was precisely machined on a polymethyl methacrylate workpiece with the micro-end-milling process. After engraving array structures, the machined surface was completely covered with the developed conductive carbon ink with a sheet resistance of 15 Ω/sq. It was cured at room temperature. Excluding the ink that filled the machined double square loop array, overflowed ink was removed with the planing process to achieve full filled and isolated resistive array patterns. The fabricated microwave absorber showed a small radar cross-section with reflectance less than − 10 dB in the frequency band range of 8.0–14.6 GHz.https://doi.org/10.1038/s41598-021-91868-y |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Ji-Young Jeong Je-Ryung Lee Hyeonjin Park Joonkyo Jung Doo-Sun Choi Eun-chae Jeon Jonghwa Shin Jun Sae Han Tae-Jin Je |
spellingShingle |
Ji-Young Jeong Je-Ryung Lee Hyeonjin Park Joonkyo Jung Doo-Sun Choi Eun-chae Jeon Jonghwa Shin Jun Sae Han Tae-Jin Je Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption Scientific Reports |
author_facet |
Ji-Young Jeong Je-Ryung Lee Hyeonjin Park Joonkyo Jung Doo-Sun Choi Eun-chae Jeon Jonghwa Shin Jun Sae Han Tae-Jin Je |
author_sort |
Ji-Young Jeong |
title |
Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption |
title_short |
Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption |
title_full |
Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption |
title_fullStr |
Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption |
title_full_unstemmed |
Fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption |
title_sort |
fabrication and characterization of resistive double square loop arrays for ultra-wide bandwidth microwave absorption |
publisher |
Nature Publishing Group |
series |
Scientific Reports |
issn |
2045-2322 |
publishDate |
2021-06-01 |
description |
Abstract Microwave absorbers using conductive ink are generally fabricated by printing an array pattern on a substrate to generate electromagnetic fields. However, screen printing processes are difficult to vary the sheet resistance values for different regions of the pattern on the same layer, because the printing process deposits materials at the same height over the entire surface of substrate. In this study, a promising manufacturing process was suggested for engraved resistive double square loop arrays with ultra-wide bandwidth microwave. The developed manufacturing process consists of a micro-end-milling, inking, and planing processes. A 144-number of double square loop array was precisely machined on a polymethyl methacrylate workpiece with the micro-end-milling process. After engraving array structures, the machined surface was completely covered with the developed conductive carbon ink with a sheet resistance of 15 Ω/sq. It was cured at room temperature. Excluding the ink that filled the machined double square loop array, overflowed ink was removed with the planing process to achieve full filled and isolated resistive array patterns. The fabricated microwave absorber showed a small radar cross-section with reflectance less than − 10 dB in the frequency band range of 8.0–14.6 GHz. |
url |
https://doi.org/10.1038/s41598-021-91868-y |
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