Al/Si Nanopillars as Very Sensitive SERS Substrates
In this paper, we present a fast fabrication of Al/Si nanopillars for an ultrasensitive SERS detection of chemical molecules. The fabrication process is only composed of two steps: use of a native oxide layer as a physical etch mask followed by evaporation of an aluminum layer. A random arrangement...
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doaj-f14903eb887542ac991586145924d2722020-11-24T21:12:36ZengMDPI AGMaterials1996-19442018-08-01119153410.3390/ma11091534ma11091534Al/Si Nanopillars as Very Sensitive SERS SubstratesGiovanni Magno0Benoit Bélier1Grégory Barbillon2Centre de Nanosciences et de Nanotechnologies, CNRS, University Paris Sud, Université Paris-Saclay, C2N-Orsay, CEDEX, 91405 Orsay, FranceCentre de Nanosciences et de Nanotechnologies, CNRS, University Paris Sud, Université Paris-Saclay, C2N-Orsay, CEDEX, 91405 Orsay, FranceEPF-Ecole d’Ingénieurs, 3 Bis Rue Lakanal, 92330 Sceaux, FranceIn this paper, we present a fast fabrication of Al/Si nanopillars for an ultrasensitive SERS detection of chemical molecules. The fabrication process is only composed of two steps: use of a native oxide layer as a physical etch mask followed by evaporation of an aluminum layer. A random arrangement of well-defined Al/Si nanopillars is obtained on a large-area wafer of Si. A good uniformity of SERS signal is achieved on the whole wafer. Finally, we investigated experimentally the sensitivity of these Al/Si nanopillars for SERS sensing, and analytical enhancement factors in the range of 1.5 × 10 7 − 2.5 × 10 7 were found for the detection of thiophenol molecules. Additionally, 3D FDTD simulations were used to better understand optical properties of Al/Si nanopillars as well as the Raman enhancement.http://www.mdpi.com/1996-1944/11/9/1534SERSsensorsaluminumsilicon |
collection |
DOAJ |
language |
English |
format |
Article |
sources |
DOAJ |
author |
Giovanni Magno Benoit Bélier Grégory Barbillon |
spellingShingle |
Giovanni Magno Benoit Bélier Grégory Barbillon Al/Si Nanopillars as Very Sensitive SERS Substrates Materials SERS sensors aluminum silicon |
author_facet |
Giovanni Magno Benoit Bélier Grégory Barbillon |
author_sort |
Giovanni Magno |
title |
Al/Si Nanopillars as Very Sensitive SERS Substrates |
title_short |
Al/Si Nanopillars as Very Sensitive SERS Substrates |
title_full |
Al/Si Nanopillars as Very Sensitive SERS Substrates |
title_fullStr |
Al/Si Nanopillars as Very Sensitive SERS Substrates |
title_full_unstemmed |
Al/Si Nanopillars as Very Sensitive SERS Substrates |
title_sort |
al/si nanopillars as very sensitive sers substrates |
publisher |
MDPI AG |
series |
Materials |
issn |
1996-1944 |
publishDate |
2018-08-01 |
description |
In this paper, we present a fast fabrication of Al/Si nanopillars for an ultrasensitive SERS detection of chemical molecules. The fabrication process is only composed of two steps: use of a native oxide layer as a physical etch mask followed by evaporation of an aluminum layer. A random arrangement of well-defined Al/Si nanopillars is obtained on a large-area wafer of Si. A good uniformity of SERS signal is achieved on the whole wafer. Finally, we investigated experimentally the sensitivity of these Al/Si nanopillars for SERS sensing, and analytical enhancement factors in the range of 1.5 × 10 7 − 2.5 × 10 7 were found for the detection of thiophenol molecules. Additionally, 3D FDTD simulations were used to better understand optical properties of Al/Si nanopillars as well as the Raman enhancement. |
topic |
SERS sensors aluminum silicon |
url |
http://www.mdpi.com/1996-1944/11/9/1534 |
work_keys_str_mv |
AT giovannimagno alsinanopillarsasverysensitiveserssubstrates AT benoitbelier alsinanopillarsasverysensitiveserssubstrates AT gregorybarbillon alsinanopillarsasverysensitiveserssubstrates |
_version_ |
1716750461266034688 |