Finding the optimum design of the planar cutoff probe through a computational study
A new plasma diagnostic tool called the planar cutoff probe (PCP), recently developed by Kim et al. [Plasma Sources Sci. Technol. 28, 015004(2019)], can be embedded into a chamber wall or wafer chuck electrode for non-invasive electron density measurements. The application feasibility of the probe h...
Main Authors: | S. J. Kim, J. J. Lee, Y. S. Lee, D. W. Kim, S. J. You |
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Format: | Article |
Language: | English |
Published: |
AIP Publishing LLC
2021-02-01
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Series: | AIP Advances |
Online Access: | http://dx.doi.org/10.1063/5.0033222 |
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