Effects of Sm<sub>2</sub>O<sub>3</sub> and V<sub>2</sub>O<sub>5</sub> Film Stacking on Switching Behaviors of Resistive Random Access Memories
In this work, the resistive switching characteristics of resistive random access memories (RRAMs) containing Sm<sub>2</sub>O<sub>3</sub> and V<sub>2</sub>O<sub>5</sub> films were investigated. All the RRAM structures made in this work showed stable res...
Main Authors: | Jian-Yang Lin, Kuang-Yao Wu, Kai-Huang Chen |
---|---|
Format: | Article |
Language: | English |
Published: |
MDPI AG
2019-06-01
|
Series: | Crystals |
Subjects: | |
Online Access: | https://www.mdpi.com/2073-4352/9/6/318 |
Similar Items
-
Enhancing the Electrical Uniformity and Reliability of the HfO<sub>2</sub>-Based RRAM Using High-Permittivity Ta<sub>2</sub>O<sub>5</sub> Side Wall
by: Mei Yuan, et al.
Published: (2018-01-01) -
Nonvolatile Electrochemical Metallization Memory Based on Nanocrystalline La<sub>2</sub>O<sub>3</sub> Solid Electrolyte Thin Film
by: Hongbin Zhao, et al.
Published: (2015-01-01) -
Effect of Annealing Temperature for Ni/AlO<sub>x</sub>/Pt RRAM Devices Fabricated with Solution-Based Dielectric
by: Zongjie Shen, et al.
Published: (2019-07-01) -
Low Power and Ultrafast Multi-State Switching in nc-Al Induced Al<sub>2</sub>O<sub>3</sub>/Al<sub>x</sub>O<sub>y</sub> Bilayer Thin Film RRAM Device
by: Wei Zhu, et al.
Published: (2020-01-01) -
Improved Intrinsic Nonlinear Characteristics of Ta<sub>2</sub>O<sub>5</sub>/Al<sub>2</sub>O<sub>3</sub>-Based Resistive Random-Access Memory for High-density Memory Applications
by: Ji-Ho Ryu, et al.
Published: (2020-09-01)