<b>Tolerance to Polycyclic Aromatic Hydrocarbons (PAHs) by filamentous fungi isolated from contaminated sediment in the Amazon region

Tolerance to Polycyclic Hydrocarbons Aromatic (PAHs) is considered an important characteristic when assessing the bioremediation potential of microorganisms. Given this, the objective of this research was to assay filamentous fungi from the Amazon region, isolated from sediments with differents leve...

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Main Authors: Hilton Marcelo de Lima Souza, Lindimar Rosas Barreto, Adolfo José da Mota, Luiz Antônio de Oliveira, Hileia dos Santos Barroso, Sandra Patricia Zanotto
Format: Article
Language:English
Published: Universidade Estadual de Maringá 2017-11-01
Series:Acta Scientiarum : Biological Sciences
Subjects:
Online Access:http://periodicos.uem.br/ojs/index.php/ActaSciBiolSci/article/view/34709
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spelling doaj-f8a5e7a5215d4dc5813496616b5c42f52020-11-25T01:50:54ZengUniversidade Estadual de MaringáActa Scientiarum : Biological Sciences1679-92831807-863X2017-11-0139448148810.4025/actascibiolsci.v39i4.3470917223<b>Tolerance to Polycyclic Aromatic Hydrocarbons (PAHs) by filamentous fungi isolated from contaminated sediment in the Amazon regionHilton Marcelo de Lima Souza0Lindimar Rosas Barreto1Adolfo José da Mota2Luiz Antônio de Oliveira3Hileia dos Santos Barroso4Sandra Patricia Zanotto5Universidade do Estado do AmazonasUniversidade do Estado do AmazonasUniversidade Federal do AmazonasInstituto Nacional de Pesquisas da AmazôniaUniversidade do Estado do AmazonasCentro de Biotecnologia da AmazôniaTolerance to Polycyclic Hydrocarbons Aromatic (PAHs) is considered an important characteristic when assessing the bioremediation potential of microorganisms. Given this, the objective of this research was to assay filamentous fungi from the Amazon region, isolated from sediments with differents levels of contamination by PAHs, for tolerance to phenanthrene and pyrene. To achieve this, fungal cultures plugs (5 mm), obtained after 7 days growth, were transferred to petri dishes containing 20% Sabouraud dextrose agar medium, after surface innoculation with phenanthrene and pyrene crystals, separately. Radial mycelial growth was evaluated after 10 days at five different concentration levels for each contaminant and control group, all in triplicate for each treatment. Fungal growth and growth inhibition rates were calculated. The average growth of the colonies in each treatment was compared with one-way ANOVA, followed by a Tukey Test (p < 0,05). All fungi showed tolerant to phenanthrene and pyrene. However, Hypoxylon sp. showed the lowest growth inhibition rate and average growth rates significantly different of the other six tested species. Hypoxylon sp. has been shown to be a promising genetic resource for use in new studies of PAHs degradation.http://periodicos.uem.br/ojs/index.php/ActaSciBiolSci/article/view/34709phenanthrenepyrenefungal growth inhibitionAmazon.
collection DOAJ
language English
format Article
sources DOAJ
author Hilton Marcelo de Lima Souza
Lindimar Rosas Barreto
Adolfo José da Mota
Luiz Antônio de Oliveira
Hileia dos Santos Barroso
Sandra Patricia Zanotto
spellingShingle Hilton Marcelo de Lima Souza
Lindimar Rosas Barreto
Adolfo José da Mota
Luiz Antônio de Oliveira
Hileia dos Santos Barroso
Sandra Patricia Zanotto
<b>Tolerance to Polycyclic Aromatic Hydrocarbons (PAHs) by filamentous fungi isolated from contaminated sediment in the Amazon region
Acta Scientiarum : Biological Sciences
phenanthrene
pyrene
fungal growth inhibition
Amazon.
author_facet Hilton Marcelo de Lima Souza
Lindimar Rosas Barreto
Adolfo José da Mota
Luiz Antônio de Oliveira
Hileia dos Santos Barroso
Sandra Patricia Zanotto
author_sort Hilton Marcelo de Lima Souza
title <b>Tolerance to Polycyclic Aromatic Hydrocarbons (PAHs) by filamentous fungi isolated from contaminated sediment in the Amazon region
title_short <b>Tolerance to Polycyclic Aromatic Hydrocarbons (PAHs) by filamentous fungi isolated from contaminated sediment in the Amazon region
title_full <b>Tolerance to Polycyclic Aromatic Hydrocarbons (PAHs) by filamentous fungi isolated from contaminated sediment in the Amazon region
title_fullStr <b>Tolerance to Polycyclic Aromatic Hydrocarbons (PAHs) by filamentous fungi isolated from contaminated sediment in the Amazon region
title_full_unstemmed <b>Tolerance to Polycyclic Aromatic Hydrocarbons (PAHs) by filamentous fungi isolated from contaminated sediment in the Amazon region
title_sort <b>tolerance to polycyclic aromatic hydrocarbons (pahs) by filamentous fungi isolated from contaminated sediment in the amazon region
publisher Universidade Estadual de Maringá
series Acta Scientiarum : Biological Sciences
issn 1679-9283
1807-863X
publishDate 2017-11-01
description Tolerance to Polycyclic Hydrocarbons Aromatic (PAHs) is considered an important characteristic when assessing the bioremediation potential of microorganisms. Given this, the objective of this research was to assay filamentous fungi from the Amazon region, isolated from sediments with differents levels of contamination by PAHs, for tolerance to phenanthrene and pyrene. To achieve this, fungal cultures plugs (5 mm), obtained after 7 days growth, were transferred to petri dishes containing 20% Sabouraud dextrose agar medium, after surface innoculation with phenanthrene and pyrene crystals, separately. Radial mycelial growth was evaluated after 10 days at five different concentration levels for each contaminant and control group, all in triplicate for each treatment. Fungal growth and growth inhibition rates were calculated. The average growth of the colonies in each treatment was compared with one-way ANOVA, followed by a Tukey Test (p < 0,05). All fungi showed tolerant to phenanthrene and pyrene. However, Hypoxylon sp. showed the lowest growth inhibition rate and average growth rates significantly different of the other six tested species. Hypoxylon sp. has been shown to be a promising genetic resource for use in new studies of PAHs degradation.
topic phenanthrene
pyrene
fungal growth inhibition
Amazon.
url http://periodicos.uem.br/ojs/index.php/ActaSciBiolSci/article/view/34709
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