UV-solvent annealing for morphology and orientation control in self-assembled PS-PDMS thin films
The response of polystyrene-block-poly(dimethylsiloxane) (PS-b-PDMS) thin films to UV exposure during solvent vapor annealing is described, in order to improve their applicability in nanolithography and nanofabrication. Two BCPs were examined, one with the PS block as majority (f[subscript PS] = 68%...
Main Authors: | Ntetsikas, K (Author), Liontos, G (Author), Avgeropoulos, A (Author), Lee, Keehong (Contributor), Kreider, Melissa E. (Contributor), Bai, Wubin (Contributor), Cheng, Li-Chen (Contributor), Dinachali, Saman Safari (Contributor), Tu, Kun-Hua (Contributor), Huang, Tao (Contributor), Ross, Caroline A (Contributor) |
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Other Authors: | Massachusetts Institute of Technology. Department of Chemical Engineering (Contributor), Massachusetts Institute of Technology. Department of Materials Science and Engineering (Contributor) |
Format: | Article |
Language: | English |
Published: |
IOP Publishing,
2017-10-18T17:49:28Z.
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Subjects: | |
Online Access: | Get fulltext |
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