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113345 |
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|a Huang, I-Chun
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|a Massachusetts Institute of Technology. Department of Chemistry
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|a Jensen, Russell Andrew
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|a Bawendi, Moungi G
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|a Holzgrafe, Jeffrey
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|a Choy, Jennifer T.
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|a Lončar, Marko
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|a Jensen, Russell Andrew
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|a Bawendi, Moungi G
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|a 10 nm gap bowtie plasmonic apertures fabricated by modified lift-off process
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|b American Institute of Physics (AIP),
|c 2018-01-30T15:47:33Z.
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|z Get fulltext
|u http://hdl.handle.net/1721.1/113345
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|a Bowtie plasmonic apertures, with gap sizes down to 11 nm and silver film thickness of up to 150 nm (aspect ratio 14:1), were fabricated on a silicon nitride membrane. Transmission spectra feature the aperture resonances ranging from 470 to 687 nm, with quality factors around 10. The mode area of the smallest gap aperture is estimated to be as small as 0.002 (k/n)[superscript 2] using numerical modeling. Importantly, our fabrication technique, based on an e-beam lithography and a lift-off process, is scalable which allows fabrication of many devices in parallel over a relatively large area. We believe that the devices demonstrated in this work will find application in studying and engineering light-matter interactions.
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|a Article
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|t Applied Physics Letters
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