Enhanced Thermoelectric Performance of Polycrystalline Si0.8Ge0.2 Alloys through the Addition of Nanoscale Porosity

Engineering materials to include nanoscale porosity or other nanoscale structures has become a well-established strategy for enhancing the thermoelectric performance of dielectrics. However, the approach is only considered beneficial for materials where the intrinsic phonon mean-free path is much lo...

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Bibliographic Details
Main Authors: Hosseini, S. Aria (Author), Romano, Giuseppe (Author), Greaney, P. Alex (Author)
Other Authors: Massachusetts Institute of Technology. Institute for Soldier Nanotechnologies (Contributor)
Format: Article
Language:English
Published: Multidisciplinary Digital Publishing Institute, 2022-01-24T14:37:19Z.
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Online Access:Get fulltext
LEADER 02874 am a22001693u 4500
001 133180.2
042 |a dc 
100 1 0 |a Hosseini, S. Aria  |e author 
100 1 0 |a Massachusetts Institute of Technology. Institute for Soldier Nanotechnologies  |e contributor 
700 1 0 |a Romano, Giuseppe  |e author 
700 1 0 |a Greaney, P. Alex  |e author 
245 0 0 |a Enhanced Thermoelectric Performance of Polycrystalline Si0.8Ge0.2 Alloys through the Addition of Nanoscale Porosity 
260 |b Multidisciplinary Digital Publishing Institute,   |c 2022-01-24T14:37:19Z. 
856 |z Get fulltext  |u https://hdl.handle.net/1721.1/133180.2 
520 |a Engineering materials to include nanoscale porosity or other nanoscale structures has become a well-established strategy for enhancing the thermoelectric performance of dielectrics. However, the approach is only considered beneficial for materials where the intrinsic phonon mean-free path is much longer than that of the charge carriers. As such, the approach would not be expected to provide significant performance gains in polycrystalline semiconducting alloys, such as Si<sub>x</sub>Ge<sub>1-x</sub>, where mass disorder and grains provide strong phonon scattering. In this manuscript, we demonstrate that the addition of nanoscale porosity to even ultrafine-grained Si<inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><msub><mrow></mrow><mrow><mn>0.8</mn></mrow></msub></semantics></math></inline-formula>Ge<inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><msub><mrow></mrow><mrow><mn>0.2</mn></mrow></msub></semantics></math></inline-formula> may be worthwhile. The semiclassical Boltzmann transport equation was used to model electrical and phonon transport in polycrystalline Si<inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><msub><mrow></mrow><mrow><mn>0.8</mn></mrow></msub></semantics></math></inline-formula>Ge<inline-formula><math xmlns="http://www.w3.org/1998/Math/MathML" display="inline"><semantics><msub><mrow></mrow><mrow><mn>0.2</mn></mrow></msub></semantics></math></inline-formula> containing prismatic pores perpendicular to the transport current. The models are free of tuning parameters and were validated against experimental data. The models reveal that a combination of pores and grain boundaries suppresses phonon conductivity to a magnitude comparable with the electronic thermal conductivity. In this regime, <i>ZT</i> can be further enhanced by reducing carrier concentration to the electrical and electronic thermal conductivity and simultaneously increasing thermopower. Although increases in <i>ZT</i> are modest, the optimal carrier concentration is significantly lowered, meaning semiconductors need not be so strongly supersaturated with dopants. 
655 7 |a Article 
773 |t Nanomaterials