|
|
|
|
| LEADER |
01610 am a22003133u 4500 |
| 001 |
59388 |
| 042 |
|
|
|a dc
|
| 100 |
1 |
0 |
|a Hu, Juejun
|e author
|
| 100 |
1 |
0 |
|a MIT Materials Research Laboratory
|e contributor
|
| 100 |
1 |
0 |
|a Massachusetts Institute of Technology. Department of Materials Science and Engineering
|e contributor
|
| 100 |
1 |
0 |
|a Massachusetts Institute of Technology. Microphotonics Center
|e contributor
|
| 100 |
1 |
0 |
|a Kimerling, Lionel C.
|e contributor
|
| 100 |
1 |
0 |
|a Hu, Juejun
|e contributor
|
| 100 |
1 |
0 |
|a Feng, Ning-Ning
|e contributor
|
| 100 |
1 |
0 |
|a Agarwal, Anuradha Murthy
|e contributor
|
| 100 |
1 |
0 |
|a Kimerling, Lionel C.
|e contributor
|
| 700 |
1 |
0 |
|a Feng, Ning-Ning
|e author
|
| 700 |
1 |
0 |
|a Agarwal, Anuradha Murthy
|e author
|
| 700 |
1 |
0 |
|a Kimerling, Lionel C.
|e author
|
| 700 |
1 |
0 |
|a Carlie, Nathan
|e author
|
| 700 |
1 |
0 |
|a Petit, Laeticia
|e author
|
| 700 |
1 |
0 |
|a Richardson, Kathleen
|e author
|
| 245 |
0 |
0 |
|a Optical loss reduction in HIC chalcogenide glass waveguides via thermal reflow
|
| 260 |
|
|
|b Institute of Electrical and Electronics Engineers,
|c 2010-10-15T19:43:29Z.
|
| 856 |
|
|
|z Get fulltext
|u http://hdl.handle.net/1721.1/59388
|
| 520 |
|
|
|a A rapid thermal reflow technique is applied to high-index-contrast, sub-micron waveguides in As[subscript 2]S[subscript 3] chalcogenide glass to reduce sidewall roughness and associated optical scattering loss. Up to 50% optical loss reduction after reflow treatment is achieved.
|
| 546 |
|
|
|a en_US
|
| 655 |
7 |
|
|a Article
|
| 773 |
|
|
|t Proceedings of the Conference on Lasers and Electro-Optics, 2009 and 2009 Conference on Quantum electronics and Laser Science Conference
|
