Analysis and prediction of defects in UV photo-initiated polymer microarrays

Polymer microarrays are a key enabling technology for the discovery of novel materials. This technology can be further enhanced by expanding the combinatorial space represented on an array. However, not all materials are compatible with the microarray format and materials must be screened to assess...

Full description

Bibliographic Details
Main Authors: Hook, Andrew L. (Author), Scurr, David J. (Author), Burley, Jonathan C. (Author), Anderson, Daniel Griffith (Contributor), Davies, Martyn C. (Author), Alexander, Morgan R. (Author), Langer, Robert S (Author)
Other Authors: Massachusetts Institute of Technology. Department of Chemical Engineering (Contributor), Koch Institute for Integrative Cancer Research at MIT (Contributor), Langer, Robert (Contributor)
Format: Article
Language:English
Published: Royal Society of Chemistry, 2014-10-31T14:15:57Z.
Subjects:
Online Access:Get fulltext
LEADER 02690 am a22002893u 4500
001 91249
042 |a dc 
100 1 0 |a Hook, Andrew L.  |e author 
100 1 0 |a Massachusetts Institute of Technology. Department of Chemical Engineering  |e contributor 
100 1 0 |a Koch Institute for Integrative Cancer Research at MIT  |e contributor 
100 1 0 |a Langer, Robert  |e contributor 
100 1 0 |a Anderson, Daniel Griffith  |e contributor 
700 1 0 |a Scurr, David J.  |e author 
700 1 0 |a Burley, Jonathan C.  |e author 
700 1 0 |a Anderson, Daniel Griffith  |e author 
700 1 0 |a Davies, Martyn C.  |e author 
700 1 0 |a Alexander, Morgan R.  |e author 
700 1 0 |a Langer, Robert S  |e author 
245 0 0 |a Analysis and prediction of defects in UV photo-initiated polymer microarrays 
260 |b Royal Society of Chemistry,   |c 2014-10-31T14:15:57Z. 
856 |z Get fulltext  |u http://hdl.handle.net/1721.1/91249 
520 |a Polymer microarrays are a key enabling technology for the discovery of novel materials. This technology can be further enhanced by expanding the combinatorial space represented on an array. However, not all materials are compatible with the microarray format and materials must be screened to assess their suitability with the microarray manufacturing methodology prior to their inclusion in a materials discovery investigation. In this study a library of materials expressed on the microarray format are assessed by light microscopy, atomic force microscopy and time-of-flight secondary ion mass spectrometry to identify compositions with defects that cause a polymer spot to exhibit surface properties significantly different from a smooth, round, chemically homogeneous 'normal' spot. It was demonstrated that the presence of these defects could be predicted in 85% of cases using a partial least square regression model based upon molecular descriptors of the monomer components of the polymeric materials. This may allow for potentially defective materials to be identified prior to their formation. Analysis of the PLS regression model highlighted some chemical properties that influenced the formation of defects, and in particular suggested that mixing a methacrylate and an acrylate monomer and/or mixing monomers with long and linear or short and bulky pendant groups will prevent the formation of defects. These results are of interest for the formation of polymer microarrays and may also inform the formulation of printed polymer materials generally. 
520 |a Burroughs Wellcome Fund (grant number 085245) 
520 |a Royal Society (Great Britain) (Wolfson Research Merit Award) 
546 |a en_US 
655 7 |a Article 
773 |t Journal of Materials Chemistry B