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|a Alexander-Katz, Alfredo
|e author
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|a Massachusetts Institute of Technology. Department of Electrical Engineering and Computer Science
|e contributor
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|a Massachusetts Institute of Technology. Department of Materials Science and Engineering
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|a Massachusetts Institute of Technology. Research Laboratory of Electronics
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|a Tavakkoli Kermani Ghariehali, Amir
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|a Alexander-Katz, Alfredo
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|a Tavakkoli Kermani Ghariehali, Amir
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|a Nicaise, Sam
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|a Hannon, Adam F.
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|a Gotrik, Kevin W.
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|a Ross, Caroline A.
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|a Berggren, Karl K.
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|a Ross, Caroline A.
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|a Berggren, Karl K.
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|a Tavakkoli Kermani Ghariehali, Amir
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|a Nicaise, Sam
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|a Hannon, Adam F.
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|a Gotrik, Kevin W.
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|a Sacrificial-Post Templating Method for Block Copolymer Self-Assembly
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|b Wiley Blackwell,
|c 2015-01-06T19:01:20Z.
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| 856 |
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|z Get fulltext
|u http://hdl.handle.net/1721.1/92711
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|a A sacrificial-post templating method is presented for directing block copolymer self-assembly to form nanostructures consisting of monolayers and bilayers of microdomains. In this approach, the topographical post template is removed after self-assembly and therefore is not incorporated into the final microdomain pattern. Arrays of nanoscale holes of different shapes and symmetries, including mesh structures and perforated lamellae with a bimodal pore size distribution, are produced. The ratio of the pore sizes in the bimodal distributions can be varied via the template pitch, and agrees with predictions of self consistent field theory.
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|a Semiconductor Research Corporation
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|a FENA Center
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|a Semiconductor Research Corporation. Nanoscale Research Initiative
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|a Singapore-MIT Alliance
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|a National Science Foundation (U.S.)
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|a Tokyo Electron Limited
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|a Taiwan Semicondcutor Manufacturing Company
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|a en_US
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|a Article
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|t Small
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