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02190 am a22003253u 4500 |
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97226 |
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|a Powell, D. M.
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|a Massachusetts Institute of Technology. Department of Mechanical Engineering
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|a Massachusetts Institute of Technology. Research Laboratory of Electronics
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|a Powell, D. M.
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|a Hofstetter, Jasmin
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|a Fenning, David P.
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|a Buonassisi, Tonio
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|a Hao, R.
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|a Ravi, T. S.
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|a Hofstetter, Jasmin
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|a Fenning, David P.
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|a Buonassisi, Tonio
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|a Effective lifetimes exceeding 300 μs in gettered p-type epitaxial kerfless silicon for photovoltaics
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|b American Institute of Physics (AIP),
|c 2015-06-08T18:58:01Z.
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|z Get fulltext
|u http://hdl.handle.net/1721.1/97226
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|a We evaluate defect concentrations and investigate the lifetime potential of p-type single-crystal kerfless silicon produced via epitaxy for photovoltaics. In gettered material, low interstitial iron concentrations (as low as (3.2 ± 2.2) × 10[superscript 9] cm[superscript −3]) suggest that minority-carrier lifetime is not limited by dissolved iron. An increase in gettered lifetime from <20 to >300 μs is observed after increasing growth cleanliness. This improvement coincides with reductions in the concentration of Mo, V, Nb, and Cr impurities, but negligible change in the low area-fraction (<5%) of dislocated regions. Device simulations indicate that the high bulk lifetime of this material could support solar cell efficiencies >23%.
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|a United States. Dept. of Energy (Contract DE-EE0005314)
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|a National Science Foundation (U.S.) (United States. Dept. of Energy NSF CA EEC-1041895)
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|a American Society for Engineering Education. National Defense Science and Engineering Graduate Fellowship
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|a Alexander von Humboldt-Stiftung (Feodor Lynen Postdoctoral Fellowship)
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|a en_US
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|a Article
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|t Applied Physics Letters
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