In-situ monitoring of reactive ion etching

Bibliographic Details
Main Author:	Baker, Michael Douglas
Published:	Georgia Institute of Technology 2007
Subjects:	Etching Plasma etching Semiconductors Etching
Online Access:	http://hdl.handle.net/1853/15352

id	ndltd-GATECH-oai-smartech.gatech.edu-1853-15352
record_format	oai_dc
spelling	ndltd-GATECH-oai-smartech.gatech.edu-1853-153522013-12-15T03:34:17ZIn-situ monitoring of reactive ion etchingBaker, Michael DouglasEtchingPlasma etchingSemiconductors EtchingGeorgia Institute of Technology2007-06-29T11:31:10Z2007-06-29T11:31:10Z1996-12Dissertationhttp://hdl.handle.net/1853/15352438442Access restricted to authorized Georgia Tech users only.
collection	NDLTD
sources	NDLTD
topic	Etching Plasma etching Semiconductors Etching
spellingShingle	Etching Plasma etching Semiconductors Etching Baker, Michael Douglas In-situ monitoring of reactive ion etching
author	Baker, Michael Douglas
author_facet	Baker, Michael Douglas
author_sort	Baker, Michael Douglas
title	In-situ monitoring of reactive ion etching
title_short	In-situ monitoring of reactive ion etching
title_full	In-situ monitoring of reactive ion etching
title_fullStr	In-situ monitoring of reactive ion etching
title_full_unstemmed	In-situ monitoring of reactive ion etching
title_sort	in-situ monitoring of reactive ion etching
publisher	Georgia Institute of Technology
publishDate	2007
url	http://hdl.handle.net/1853/15352
work_keys_str_mv	AT bakermichaeldouglas insitumonitoringofreactiveionetching
_version_	1716617829307908096

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