In situ sensing for chemical vapor deposition based on state estimation theory
Chemical vapor deposition (CVD) is an industrially important process to deposit crystalline and amorphous thin films on solid substrates. In situ sensing for CVD is necessary for process monitoring, fault detection, and process control. The challenge of in situ sensing lies in the prohibitive enviro...
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Georgia Institute of Technology
2008
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| Online Access: | http://hdl.handle.net/1853/22711 |