The effect of low energy ion bombardment on the crystallographic orientation of thin films
Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Materials Science and Engineering, 1985. === MICROFICHE COPY AVAILABLE IN ARCHIVES AND SCIENCE. === Includes bibliographical references. === by Lock See Yu. === M.S.
Main Author: | Yu, Lock See |
---|---|
Other Authors: | L. Rafael Reif. |
Format: | Others |
Language: | English |
Published: |
Massachusetts Institute of Technology
2005
|
Subjects: | |
Online Access: | http://hdl.handle.net/1721.1/15310 |
Similar Items
-
Crystallographic origins of fast-ion conduction in pyrochlore
by: Eberman, Kevin W. (Kevin Wilmot), 1971-
Published: (2010) -
Lithium-ion Batteries : Thin Film for Energy Materials and Devices
Published: (2020) -
Novel Low Temperature Processing for Enhanced Properties of Ion Implanted Thin Films and Amorphous Mixed Oxide Thin Film Transistors
Published: (2013) -
Ion beam assisted deposition of biaxially aligned oxide thin films
by: Ressler, Kevin Glenn
Published: (2005) -
Investigation of the effects of low energy high dose ion bombardment in metals and compound semiconductors
by: Sangheera, Harpreet Kaur
Published: (1998)