Chemical vapor deposition of organosilicon composite thin films for porous low-k dielectrics
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Chemical Engineering, 2005. === Includes bibliographical references. === Pulsed plasma enhanced chemical vapor deposition has produced organosilicon thin films with the potential use as low dielectric constant interconnect materials in...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2007
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| Online Access: | http://dspace.mit.edu/handle/1721.1/28846 http://hdl.handle.net/1721.1/28846 |