Applying run-by-run process control to chemical-mechanical planarization and assessing insertion costs versus benefits of CMP

Applying run-by-run process control to chemical-mechanical planarization and assessing insertion costs versus benefits of CMP

Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1995, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995. === Includes bibliographical references (p. 87-89). === by Arthur H. Altman. === M.S.

Bibliographic Details
Main Author: Altman, Arthur H
Other Authors: Duane Boning, Jeffrey A. Barks.
Format: Others
Language:English
Published: Massachusetts Institute of Technology 2007
Subjects:
Sloan School of Management
Electrical Engineering and Computer Science
Online Access:http://hdl.handle.net/1721.1/37766
Description
Summary:Thesis (M.S.)--Massachusetts Institute of Technology, Sloan School of Management, 1995, and Thesis (M.S.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 1995. === Includes bibliographical references (p. 87-89). === by Arthur H. Altman. === M.S.

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