Sub-10-nm lithography with light-ion beams
Thesis (Ph. D.)--Massachusetts Institute of Technology, Dept. of Electrical Engineering and Computer Science, 2012. === Cataloged from PDF version of thesis. === Includes bibliographical references (p. 203-212). === Scanning-electron-beam lithography (SEBL) is the workhorse of nanoscale lithography...
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| Format: | Others |
| Language: | English |
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Massachusetts Institute of Technology
2012
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| Online Access: | http://hdl.handle.net/1721.1/71495 |