Low pressure chemical vapor deposition of thin films from metal amide complexes

碩士 === 國立交通大學 === 應用化學研究所 === 78 ===

Bibliographic Details
Main Authors: HUANG,ZHENG-ZHONG, 黃正中
Other Authors: QIU,XING-TIAN
Format: Others
Language:zh-TW
Published: 1990
Online Access:http://ndltd.ncl.edu.tw/handle/02601500217364901777
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spelling ndltd-TW-078NCTU25000232015-10-13T15:21:05Z http://ndltd.ncl.edu.tw/handle/02601500217364901777 Low pressure chemical vapor deposition of thin films from metal amide complexes 金屬胺錯化合物之低壓化學氣相沈積及薄膜成長 HUANG,ZHENG-ZHONG 黃正中 碩士 國立交通大學 應用化學研究所 78 QIU,XING-TIAN 裘性天 1990 學位論文 ; thesis 67 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立交通大學 === 應用化學研究所 === 78 ===
author2 QIU,XING-TIAN
author_facet QIU,XING-TIAN
HUANG,ZHENG-ZHONG
黃正中
author HUANG,ZHENG-ZHONG
黃正中
spellingShingle HUANG,ZHENG-ZHONG
黃正中
Low pressure chemical vapor deposition of thin films from metal amide complexes
author_sort HUANG,ZHENG-ZHONG
title Low pressure chemical vapor deposition of thin films from metal amide complexes
title_short Low pressure chemical vapor deposition of thin films from metal amide complexes
title_full Low pressure chemical vapor deposition of thin films from metal amide complexes
title_fullStr Low pressure chemical vapor deposition of thin films from metal amide complexes
title_full_unstemmed Low pressure chemical vapor deposition of thin films from metal amide complexes
title_sort low pressure chemical vapor deposition of thin films from metal amide complexes
publishDate 1990
url http://ndltd.ncl.edu.tw/handle/02601500217364901777
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