Crystalline characteristic of vacuum-deposited Ge films as function of substrate conditions
碩士 === 國立成功大學 === 化學工程研究所 === 81 === The structure of Ge films grown by thermal vacuum evaporation has been approached as functions of the different substrates including Si(100)﹑Si(111)﹑GaAs(100) and fused silica, deposi- tion temperature a...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1993
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| Online Access: | http://ndltd.ncl.edu.tw/handle/83865285288880779667 |