The Preparation of AlN and ZnO Films by R.F. Magnetron Sputtering
碩士 === 國立交通大學 === 材料科學(工程)研究所 === 81 === In this research, the AlN and ZnO films have been prepared by R. F. plane magnetron sputtering technique. The sputtering parameters such as R.F power, toal gas pressure, substrate temperature were varied to control...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1993
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| Online Access: | http://ndltd.ncl.edu.tw/handle/25607693112986911435 |