The Study of Channel Doping and Hydrogenation Effects on Polysilicon Thin Film Transistors
碩士 === 國立交通大學 === 電子研究所 === 81 === With regard to the unpassivated poly-Si TFTs with undoped channel, the magnitude of the threshold voltage is greater than 5V and the leakage current is usually not available. Thus the necessary channel...
Main Authors: | Huang-Wen Tseng, 曾皇文 |
---|---|
Other Authors: | Tan-Fu Lei; Chung-Len Lee |
Format: | Others |
Language: | en_US |
Published: |
1993
|
Online Access: | http://ndltd.ncl.edu.tw/handle/77528471304542503129 |
Similar Items
-
Effects of NH3-Annealing on Polysilicon Thin Film Transistor
by: Wen-Cheng Yen, et al.
Published: (1995) -
The Fabrication and Analysis of Hydrogenated (Deuterated) Thin Film Transistor of Amorphous Silicon and Polysilicon
by: Jiun-Lin Yeh, et al.
Published: (1999) -
A Study of Narrow Width Effect and Short Channel Effect of Submicrometer Polysilicon Thin Film Transistor with Plasma Hydrogenation and Channel Oxidation
by: Wang, Yong-Ji, et al.
Published: (1998) -
The fabrication and characterization of polysilicon thin film transistors
by: ZHENG, JIN-CHENG, et al.
Published: (1992) -
Polysilicon thin film transistor systems and circuits
by: Islam, Mujahid-ul
Published: (2007)