Preparation and electrical properties of PLT ferroelectric thin films by sol-gel processing

碩士 === 國立交通大學 === 電子研究所 === 82 === The La-modified lead titanate(PLT) with various lanthanum contents(0~28mol%)has been prepared by sol-gel processing. The PLT thin films deposited on Pt/Ti/Si substrate at 600?C for 30 min. possess crackinn...

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Main Authors: Jaw-Chyung Leu, 呂照全
Other Authors: Tseung-Yuen Tseng
Format: Others
Language:en_US
Published: 1994
Online Access:http://ndltd.ncl.edu.tw/handle/81293805441719414572
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spelling ndltd-TW-082NCTU04300642016-07-18T04:09:39Z http://ndltd.ncl.edu.tw/handle/81293805441719414572 Preparation and electrical properties of PLT ferroelectric thin films by sol-gel processing 以溶膠-凝膠法製備PLT鐵電薄膜及其電性之研究 Jaw-Chyung Leu 呂照全 碩士 國立交通大學 電子研究所 82 The La-modified lead titanate(PLT) with various lanthanum contents(0~28mol%)has been prepared by sol-gel processing. The PLT thin films deposited on Pt/Ti/Si substrate at 600?C for 30 min. possess crackinng-free, uniform grain size(about 100nm), and flat surface properties. The dielectric constants of the PLT thin films are 198, 256, 370, and 588 for PLT0, PLT10, PLT20, and PLT28, respectively. The dominant conductance mechanism of the PLT thin film has also been discussed. The conventional integrated-circuit processing has been applied to fabricated the PLT thin film capacitors. The charge storage densities of PLT thin film capacitors are 0.35, 0.46, 0.66, and 1.03uC/cm2-V for PLT0, PLT10, PLT20, and PLT28, respectively. Tseung-Yuen Tseng 曾俊元 1994 學位論文 ; thesis 77 en_US
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language en_US
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description 碩士 === 國立交通大學 === 電子研究所 === 82 === The La-modified lead titanate(PLT) with various lanthanum contents(0~28mol%)has been prepared by sol-gel processing. The PLT thin films deposited on Pt/Ti/Si substrate at 600?C for 30 min. possess crackinng-free, uniform grain size(about 100nm), and flat surface properties. The dielectric constants of the PLT thin films are 198, 256, 370, and 588 for PLT0, PLT10, PLT20, and PLT28, respectively. The dominant conductance mechanism of the PLT thin film has also been discussed. The conventional integrated-circuit processing has been applied to fabricated the PLT thin film capacitors. The charge storage densities of PLT thin film capacitors are 0.35, 0.46, 0.66, and 1.03uC/cm2-V for PLT0, PLT10, PLT20, and PLT28, respectively.
author2 Tseung-Yuen Tseng
author_facet Tseung-Yuen Tseng
Jaw-Chyung Leu
呂照全
author Jaw-Chyung Leu
呂照全
spellingShingle Jaw-Chyung Leu
呂照全
Preparation and electrical properties of PLT ferroelectric thin films by sol-gel processing
author_sort Jaw-Chyung Leu
title Preparation and electrical properties of PLT ferroelectric thin films by sol-gel processing
title_short Preparation and electrical properties of PLT ferroelectric thin films by sol-gel processing
title_full Preparation and electrical properties of PLT ferroelectric thin films by sol-gel processing
title_fullStr Preparation and electrical properties of PLT ferroelectric thin films by sol-gel processing
title_full_unstemmed Preparation and electrical properties of PLT ferroelectric thin films by sol-gel processing
title_sort preparation and electrical properties of plt ferroelectric thin films by sol-gel processing
publishDate 1994
url http://ndltd.ncl.edu.tw/handle/81293805441719414572
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