The study of polycide gate formed by CVD tungsten silicide with amorphous/poly crystalline silicon
碩士 === 國立交通大學 === 電子研究所 === 82 === In this thesis,the polycide gate formed by a stacked amorphous- silicon(α-Si)/poly-silicon structure with CVD tungsten silicide have been studied. Fisrt,the N+ polycide gates ofα-Si/ poly-Si or poly-Si/pol...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1994
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| Online Access: | http://ndltd.ncl.edu.tw/handle/26302091662796393448 |