Formation of the Novel Capacitor with Rugged Polycrystalline Silicon Films

碩士 === 國立交通大學 === 應用化學系 === 82 === For the down-scaling of DRAM cells, an advanced storage capacitor structure is required to provide sufficiently large capacitance in a limited area.Many researches have been reported to meet the re...

Full description

Bibliographic Details
Main Authors: Bor Kwan Sheu, 許伯寬
Other Authors: Huang Chung Cheng
Format: Others
Language:en_US
Published: 1994
Online Access:http://ndltd.ncl.edu.tw/handle/95359551892238537480

Similar Items