The Study of Formation and Collective Behaviors of Fine Silicon -oxide Particles in RF Weakly Ionized Plasmas
博士 === 國立中央大學 === 物理與天文學研究所 === 82 === Fine SiO2 paricles are fabricated through gas phase homogeneous chemical reactions and nucleations in rf magnetron discharge in SiH4/O2/Ar gas mixtures. For P>30 mTorr, primary fine particles (PFPs) with diameter...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1994
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| Online Access: | http://ndltd.ncl.edu.tw/handle/34094478998016282107 |