PSA Simple Ellipsometer

• Main Authors: Lee Wun-Chih, 李文智
• Other Authors: Y.F. Chao
• Format: Others
• Language: zh-TW
• Published: 1995
• Online Access: http://ndltd.ncl.edu.tw/handle/42199536277152284302

碩士 === 國立交通大學 === 光電(科學)研究所 === 83 === A PSA photometric ellipsometer is introduced to measure the ellipsometric parameters psi and delta of a sample. If the field of the parallel(p) and perpendicular(s) to the plane of incident are equal, the change of the state of the pol- arization of reflected light are affected by the optical properties of sample. We will prove that only three radiances through equally spaced polarizer are needed for extracting the parameters. The results are improved by deducing measure- ments from the incident light that is linear polarized at -45(deg) to the plane of incident. The measued parameters psi and delta are used to calculate the refractive index for Pt, the thickness of thin film for SiO2 coating on Si. By comparing all the available sources, we find that our experimental error are less then 0.5%.