Application of LPCVD TiN in ULSI

碩士 === 國立清華大學 === 電機工程研究所 === 83 ===

Bibliographic Details
Main Authors: Yang, Kuo Yuh, 楊國裕
Other Authors: Huang Fon Shen
Format: Others
Language:zh-TW
Published: 1995
Online Access:http://ndltd.ncl.edu.tw/handle/46183197593670233943
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spelling ndltd-TW-083NTHU04421032015-10-13T12:26:20Z http://ndltd.ncl.edu.tw/handle/46183197593670233943 Application of LPCVD TiN in ULSI 低壓化學氣相沈積氮化鈦在超大型積體電路之應用 Yang, Kuo Yuh 楊國裕 碩士 國立清華大學 電機工程研究所 83 Huang Fon Shen 葉鳳生 1995 學位論文 ; thesis 0 zh-TW
collection NDLTD
language zh-TW
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 電機工程研究所 === 83 ===
author2 Huang Fon Shen
author_facet Huang Fon Shen
Yang, Kuo Yuh
楊國裕
author Yang, Kuo Yuh
楊國裕
spellingShingle Yang, Kuo Yuh
楊國裕
Application of LPCVD TiN in ULSI
author_sort Yang, Kuo Yuh
title Application of LPCVD TiN in ULSI
title_short Application of LPCVD TiN in ULSI
title_full Application of LPCVD TiN in ULSI
title_fullStr Application of LPCVD TiN in ULSI
title_full_unstemmed Application of LPCVD TiN in ULSI
title_sort application of lpcvd tin in ulsi
publishDate 1995
url http://ndltd.ncl.edu.tw/handle/46183197593670233943
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