Deposition PLT thin films by spray pyrolysis
碩士 === 國立成功大學 === 材料科學(工程)學系 === 84 === Ultrasonic spray pyrolysis has employed in this study to deposite PLT thinfilm on n-type silicon wafer using Ti(iC3H7O)4, Pb(CH3COO)2.3H2O,and La(CH3COO)3.xH2O as reactants. Experemental parameter...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
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| Online Access: | http://ndltd.ncl.edu.tw/handle/60856497923899076845 |