Growth Characteristics and Properties of TiN Coatings by Chemical Vapor Deposition
博士 === 國立成功大學 === 材料科學(工程)研究所 === 84 === The TiN films were deposited on graphite, SKD61, cemented carbide, and sintered Si3N4 substrates respectively by using TiCl4, N2, and H2 as reaction gases in a conventional chemical vapor deposition (CVD) system at...
| Main Authors: | , |
|---|---|
| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
1996
|
| Online Access: | http://ndltd.ncl.edu.tw/handle/51014542612703472010 |