Study on the Reliability of Ultra-Thin Oxide Grown in Large Diameter Silicon Wafers by Microwave Plasma Afterglow Oxidation

碩士 === 國立清華大學 === 電機工程研究所 === 84 ===

Bibliographic Details
Main Authors: Chen, Cheng Rong, 陳正榮
Other Authors: Hwang Huey Liang
Format: Others
Language:en_US
Published: 1996
Online Access:http://ndltd.ncl.edu.tw/handle/01180867006109851139
id ndltd-TW-084NTHU0442090
record_format oai_dc
spelling ndltd-TW-084NTHU04420902016-07-13T04:10:35Z http://ndltd.ncl.edu.tw/handle/01180867006109851139 Study on the Reliability of Ultra-Thin Oxide Grown in Large Diameter Silicon Wafers by Microwave Plasma Afterglow Oxidation 以微波電漿放電後氧化法在大面積晶片上成長超薄氧化層及其可靠度研究 Chen, Cheng Rong 陳正榮 碩士 國立清華大學 電機工程研究所 84 Hwang Huey Liang 黃惠良 1996 學位論文 ; thesis 0 en_US
collection NDLTD
language en_US
format Others
sources NDLTD
description 碩士 === 國立清華大學 === 電機工程研究所 === 84 ===
author2 Hwang Huey Liang
author_facet Hwang Huey Liang
Chen, Cheng Rong
陳正榮
author Chen, Cheng Rong
陳正榮
spellingShingle Chen, Cheng Rong
陳正榮
Study on the Reliability of Ultra-Thin Oxide Grown in Large Diameter Silicon Wafers by Microwave Plasma Afterglow Oxidation
author_sort Chen, Cheng Rong
title Study on the Reliability of Ultra-Thin Oxide Grown in Large Diameter Silicon Wafers by Microwave Plasma Afterglow Oxidation
title_short Study on the Reliability of Ultra-Thin Oxide Grown in Large Diameter Silicon Wafers by Microwave Plasma Afterglow Oxidation
title_full Study on the Reliability of Ultra-Thin Oxide Grown in Large Diameter Silicon Wafers by Microwave Plasma Afterglow Oxidation
title_fullStr Study on the Reliability of Ultra-Thin Oxide Grown in Large Diameter Silicon Wafers by Microwave Plasma Afterglow Oxidation
title_full_unstemmed Study on the Reliability of Ultra-Thin Oxide Grown in Large Diameter Silicon Wafers by Microwave Plasma Afterglow Oxidation
title_sort study on the reliability of ultra-thin oxide grown in large diameter silicon wafers by microwave plasma afterglow oxidation
publishDate 1996
url http://ndltd.ncl.edu.tw/handle/01180867006109851139
work_keys_str_mv AT chenchengrong studyonthereliabilityofultrathinoxidegrowninlargediametersiliconwafersbymicrowaveplasmaafterglowoxidation
AT chénzhèngróng studyonthereliabilityofultrathinoxidegrowninlargediametersiliconwafersbymicrowaveplasmaafterglowoxidation
AT chenchengrong yǐwēibōdiànjiāngfàngdiànhòuyǎnghuàfǎzàidàmiànjījīngpiànshàngchéngzhǎngchāobáoyǎnghuàcéngjíqíkěkàodùyánjiū
AT chénzhèngróng yǐwēibōdiànjiāngfàngdiànhòuyǎnghuàfǎzàidàmiànjījīngpiànshàngchéngzhǎngchāobáoyǎnghuàcéngjíqíkěkàodùyánjiū
_version_ 1718345086839816192