| Summary: | 碩士 === 國立臺灣科技大學 === 工程技術研究所 === 84 === Generic Equipment Control, of semiconductor manufacturing fab,
that allows control of multiple equipment at the same time, is
made possible under the premise that individual equipment
operational scenario can be {\it normalized} by its equipment
driver. However, scenario normalization for a stepper in
particular in photolithographic cell is complicated due to the
fact that: (1) the lack of ready cassette input/output ports in
providing pertinent material move in and move out messages; (2)
the necessity to be integrated with other equipment: with
Extended Wafer Loader (EWL) for offline stepper, and with
coater and developer track for inline stepper; and (3) the
additional operation requirement on reticle reservation and
pilot operation . This thesis, with the emphasis on laying the
foundation of photolithographic cell control, addresses on the
scenario normalization procedure for a stepper. First, stepper
operational scenarios at different operational modes are
analyzed based on online testing logfiles. Petri Net modeling
is employed to analyze scenarios not covered in the logfiles.
Then, normalization rules expressed in terms of ``triggering
rules'' are tabularized under various operational modes for
both offline stepper and inline stepper. Accordingly, these
rules guarantee the equipment drivers thus obtained, terms
Offline Stepper Coordinator (OSC) and Inline Stepper
Coordinator (ISC), respectively, present normalized scenarios
as required by Generic Equipment Control. Preliminary result of
photolithographic cell controller that controls both multiple
offline steppers and inline steppers with the complete
normalized OSC and ISC are also included.
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