| Summary: | 碩士 === 大同工學院 === 化學工程學系 === 85 === There are two parts in this study. In part one, the main propose
is to discuss the effects of anodizing voltage onthe properties
of oxide film which is obtained in the anodizing process of
aluminum A1100. The anodizing process is operatedat various
voltage from 5V to 20V with bath temperature from 20℃ to 30℃
by pulse current (duty cycle 60%, frequency 500Hz)in 10 vol%
sulfuric acid. The thickness of oxide film increaseswith the
increasing anodic duration time and it increases withthe
increasing voltage. And the optimal coating ratio of about 1.7
can be obtained under the conditions of 20V, 25℃ bathtemp. and
30 min anodic duration time. In part two, the factors of cold
sealing such as sealing temperature, pH value of the sealing
solution, sealing time and concentration of the nickelfluoride,
that have effects on the anodic oxide film were beenstudied. The
higher microhardness and gloss value can be obtainedat pH value
from 5 to 7. A sealed film with microhardness of 463 Hv can be
obtained under the sealing conditions of 20 g/Lnickel fluoride,
15min sealing time, pH=6 and 20℃ bath temp.Comparing the
unsealed with sealed oxide film by cold sealing and hot water
sealing. Sealing treatment does not form any newfilm on the
anodic oxide film. Abetter hardness of the anodic oxide film is
obtained in the following order: cold sealing > hot water
sealing > unsealed oxide film
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