Dynamic Scheduling of Photolithography Area in Semiconductor Wafer Fabrication Factories
碩士 === 國立臺灣科技大學 === 管理技術研究所 === 86 ===
Main Authors: | Ho Pei-Yeh, 何佩曄 |
---|---|
Other Authors: | Liao C. J. |
Format: | Others |
Language: | zh-TW |
Published: |
1998
|
Online Access: | http://ndltd.ncl.edu.tw/handle/65998030027507853574 |
Similar Items
-
An Application of TOC for Photolithography Area in Wafer Fabrication Factory
by: Yu-Chen Lin, et al.
Published: (2000) -
A Study of Dispatching Rules for Photolithography Area in Wafer Fabrication Factories
by: Hsu, Kuang-Hung, et al.
Published: (1996) -
Design of Dispatching Rule for Photolithography Area in Wafer Fabrication Factories with Rework Considerations
by: Yan-Han Chang, et al.
Published: (2002) -
A Study of Rework Strategy for Photolithography in Wafer Fabrication Factory
by: Kuan-Jen Chen, et al.
Published: (1999) -
A Study of Rework Strategies and Dispatching Rules for Photolithography in Wafer Fabrication Factories
by: Lin Shih Hsing, et al.
Published: (1999)