The stydy of topography and magnetic properties on sputtered Co thin films

• Main Authors: Lin Shia Yu, 林夏玉
• Other Authors: Huang H.L.
• Format: Others
• Language: en_US
• Published: 1999
• Online Access: http://ndltd.ncl.edu.tw/handle/78108800025439510622

碩士 === 國立臺灣大學 === 物理學研究所 === 87 === In this thesis, we describe studies of dependence of thickness, substrates and annealing effect on cobalt thin films. The details of cobalt fabrication procedures on substrates are also introduced. The samples were prepared by DC mangetron sputtering, and we measured the AFM (atomic force microscopy), MFM (magnetic force microscopy ) and MOKE ( magneto-optic Kerr effect ) on the surface of thin films. The magnetic domain images, the topography, and the hysteresis loops of cobalt thin films were measured by MFM (magnetic force microscopy), AFM (atomic force microscopy), and MOKE (magneto-optical Kerr effect), respectively. The sample was prepared on glass or silicon wafer with (100) orientation. Then the sample was annealed to 450℃ for one hour in high vacuum (HV) system. We investigate the reorientation of the magnetization direction from in plane to out of plane as the thickness of film increasing from 10nm to 75nm. We found that the coercivity of Co thin films decreases with increasing the thickness of films. After annealing, the coercivity of films enhanced slightly due to the defect of CoO doping in the Co films, homogeneously. For the magnetic domain study, we found the domain size decreases with increasing the thickness of films, however, it decreases with the annealing effect because of the homogeneously distribution of CoO defect..