Fabrication and Measurement of Single Electron Tunneling Transistor

碩士 === 國立臺灣大學 === 電機工程學研究所 === 87 === This thesis is to use E-beam lithography to fabricate Single Electron Tunneling (SET) transistor and study single electron tunneling phenomena of nanostructure under Coulomb Blockcade effect. The feature, electron transport in the SET devices one by o...

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Main Authors: SHEN-CHING SUN, 孫聖景
Other Authors: Chieh-Hsiung Kuan
Format: Others
Language:en_US
Published: 1999
Online Access:http://ndltd.ncl.edu.tw/handle/44456505617474430981
id ndltd-TW-087NTU00442014
record_format oai_dc
spelling ndltd-TW-087NTU004420142016-02-01T04:12:41Z http://ndltd.ncl.edu.tw/handle/44456505617474430981 Fabrication and Measurement of Single Electron Tunneling Transistor 單電子穿隧電晶體之製作與量測 SHEN-CHING SUN 孫聖景 碩士 國立臺灣大學 電機工程學研究所 87 This thesis is to use E-beam lithography to fabricate Single Electron Tunneling (SET) transistor and study single electron tunneling phenomena of nanostructure under Coulomb Blockcade effect. The feature, electron transport in the SET devices one by one, is different from FET in which there are uncountable electrons transporting. Due to the characteristics of small size and low power consumption of a SET transistor, it may be a promising candidate to be a new potential device. In many cases, it could replace the FET, such as high-density memory. We develop a program based on tunneling rate formula to simulate the operation of a SET transistor and observe the Coulomb Blockade and current modulation phenomena. We can adjust the characteristics of a SET transistor by applying different junction parameters, temperature and bias. We use a modified SEM (Hitachi 4200) as E-beam lithography writer to fabricate our sample. With careful design, we can define ultra small size pattern on Si substrate. After exposure, development and skillful two-angle evaporation, two small size junctions can be perfectly formed at the same time to be a SET transistor. In order to reduce thermal tunneling, we measure our sample in He3/He4 dilution refrigerator system. Dilution refrigerator can provide a low-temperature environment (below 50 mK) with varying magnetic field and temperature. Due to the ultra small signal of a SET device, we need to take care of environment noise. Thus good shielding is necessary in order to avoid unwanted tunneling event. We also use a home-made high input impedence pre-amplifier to measure our sample to promote our system accuracy. We demonstrate simulation result and measured I-V curves of our sample. We can observe that the gate voltage modulates the current and the Coulomb blockade phenomena. Fitting the I-V curve by simulation results in order to acquire the simulation model parameters. Therefore, we can analyze the validness of the SET transistor model, understand how does our system perform and discuss other factors influencing the characteristics of a SET transistor. In conclusion, we have made aluminum single electron transistors, the charging energy was about 2.6 K. The samples were measured at 0.5 K, clear Coulomb blockade oscillations were observed and the results were compared with calculations. Chieh-Hsiung Kuan Chiidong Chen 管傑雄 陳啟東 1999 學位論文 ; thesis 60 en_US
collection NDLTD
language en_US
format Others
sources NDLTD
description 碩士 === 國立臺灣大學 === 電機工程學研究所 === 87 === This thesis is to use E-beam lithography to fabricate Single Electron Tunneling (SET) transistor and study single electron tunneling phenomena of nanostructure under Coulomb Blockcade effect. The feature, electron transport in the SET devices one by one, is different from FET in which there are uncountable electrons transporting. Due to the characteristics of small size and low power consumption of a SET transistor, it may be a promising candidate to be a new potential device. In many cases, it could replace the FET, such as high-density memory. We develop a program based on tunneling rate formula to simulate the operation of a SET transistor and observe the Coulomb Blockade and current modulation phenomena. We can adjust the characteristics of a SET transistor by applying different junction parameters, temperature and bias. We use a modified SEM (Hitachi 4200) as E-beam lithography writer to fabricate our sample. With careful design, we can define ultra small size pattern on Si substrate. After exposure, development and skillful two-angle evaporation, two small size junctions can be perfectly formed at the same time to be a SET transistor. In order to reduce thermal tunneling, we measure our sample in He3/He4 dilution refrigerator system. Dilution refrigerator can provide a low-temperature environment (below 50 mK) with varying magnetic field and temperature. Due to the ultra small signal of a SET device, we need to take care of environment noise. Thus good shielding is necessary in order to avoid unwanted tunneling event. We also use a home-made high input impedence pre-amplifier to measure our sample to promote our system accuracy. We demonstrate simulation result and measured I-V curves of our sample. We can observe that the gate voltage modulates the current and the Coulomb blockade phenomena. Fitting the I-V curve by simulation results in order to acquire the simulation model parameters. Therefore, we can analyze the validness of the SET transistor model, understand how does our system perform and discuss other factors influencing the characteristics of a SET transistor. In conclusion, we have made aluminum single electron transistors, the charging energy was about 2.6 K. The samples were measured at 0.5 K, clear Coulomb blockade oscillations were observed and the results were compared with calculations.
author2 Chieh-Hsiung Kuan
author_facet Chieh-Hsiung Kuan
SHEN-CHING SUN
孫聖景
author SHEN-CHING SUN
孫聖景
spellingShingle SHEN-CHING SUN
孫聖景
Fabrication and Measurement of Single Electron Tunneling Transistor
author_sort SHEN-CHING SUN
title Fabrication and Measurement of Single Electron Tunneling Transistor
title_short Fabrication and Measurement of Single Electron Tunneling Transistor
title_full Fabrication and Measurement of Single Electron Tunneling Transistor
title_fullStr Fabrication and Measurement of Single Electron Tunneling Transistor
title_full_unstemmed Fabrication and Measurement of Single Electron Tunneling Transistor
title_sort fabrication and measurement of single electron tunneling transistor
publishDate 1999
url http://ndltd.ncl.edu.tw/handle/44456505617474430981
work_keys_str_mv AT shenchingsun fabricationandmeasurementofsingleelectrontunnelingtransistor
AT sūnshèngjǐng fabricationandmeasurementofsingleelectrontunnelingtransistor
AT shenchingsun dāndiànzichuānsuìdiànjīngtǐzhīzhìzuòyǔliàngcè
AT sūnshèngjǐng dāndiànzichuānsuìdiànjīngtǐzhīzhìzuòyǔliàngcè
_version_ 1718174473152102400