A Study of Shallow Junction Formation by Using Low Thermal Budget
碩士 === 國立臺灣科技大學 === 電子工程系 === 87 === The scaling of CMOS devices to satisfy deep submicrometer technology requirements involves several process adjustments . One of the main challenges is the formation of shallow junction . Low-energy ion implantation , in tandem with low-thermal budget a...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | en_US |
| Published: |
1999
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| Online Access: | http://ndltd.ncl.edu.tw/handle/78378584814180772272 |