Ultra Thin Tantalum Pentaoxide Dielectric Film
碩士 === 國立交通大學 === 材料科學與工程系 === 88 === In this study, we use magnetron frequency sputter technique to make Iridium Oxide (IrOx) bottom electrode and amorphous ultra thin (as-deposited thickness 48Å~125Å)tantalum pentaoxide (Ta2O5). After the Al/Ta2O5/IrOx/SiO2/Si structure is obtained, we...
| Main Authors: | , |
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| Other Authors: | |
| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/13708392527272040487 |