The Study of the Temperature Ramp-up Rate on the Warpage of IC Packages in the IR-reflow Process

碩士 === 國立中山大學 === 機械工程學系研究所 === 88 === The main aim of this study is to extending the holographic interferometry technique to measure the effect of the temperature ramp-up rate on the warpage of IC packages in the IR-reflow process . It is noted that both the warpage and the ambient temperature chan...

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Main Authors: Chih-Fang Chang, 張志方
Other Authors: Chi-Hui Chien
Format: Others
Language:zh-TW
Published: 2000
Online Access:http://ndltd.ncl.edu.tw/handle/06023236914875758794
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spelling ndltd-TW-088NSYS54900802016-07-08T04:22:58Z http://ndltd.ncl.edu.tw/handle/06023236914875758794 The Study of the Temperature Ramp-up Rate on the Warpage of IC Packages in the IR-reflow Process 半導體構裝於IR-reflow過程中在不同之溫升速率下翹曲之研究 Chih-Fang Chang 張志方 碩士 國立中山大學 機械工程學系研究所 88 The main aim of this study is to extending the holographic interferometry technique to measure the effect of the temperature ramp-up rate on the warpage of IC packages in the IR-reflow process . It is noted that both the warpage and the ambient temperature change can cause image fringes. Therefore, an auxiliary sphere is used to identify the fringe numbers caused by the ambient temperature change during the experiment. Then, the Taguchi method will be deduced to study the effect of the temperature ramp-up rate and peak waiting temperature on the warpage of PBGA package in the IR-reflow process. Chi-Hui Chien 錢志回 2000 學位論文 ; thesis 83 zh-TW
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language zh-TW
format Others
sources NDLTD
description 碩士 === 國立中山大學 === 機械工程學系研究所 === 88 === The main aim of this study is to extending the holographic interferometry technique to measure the effect of the temperature ramp-up rate on the warpage of IC packages in the IR-reflow process . It is noted that both the warpage and the ambient temperature change can cause image fringes. Therefore, an auxiliary sphere is used to identify the fringe numbers caused by the ambient temperature change during the experiment. Then, the Taguchi method will be deduced to study the effect of the temperature ramp-up rate and peak waiting temperature on the warpage of PBGA package in the IR-reflow process.
author2 Chi-Hui Chien
author_facet Chi-Hui Chien
Chih-Fang Chang
張志方
author Chih-Fang Chang
張志方
spellingShingle Chih-Fang Chang
張志方
The Study of the Temperature Ramp-up Rate on the Warpage of IC Packages in the IR-reflow Process
author_sort Chih-Fang Chang
title The Study of the Temperature Ramp-up Rate on the Warpage of IC Packages in the IR-reflow Process
title_short The Study of the Temperature Ramp-up Rate on the Warpage of IC Packages in the IR-reflow Process
title_full The Study of the Temperature Ramp-up Rate on the Warpage of IC Packages in the IR-reflow Process
title_fullStr The Study of the Temperature Ramp-up Rate on the Warpage of IC Packages in the IR-reflow Process
title_full_unstemmed The Study of the Temperature Ramp-up Rate on the Warpage of IC Packages in the IR-reflow Process
title_sort study of the temperature ramp-up rate on the warpage of ic packages in the ir-reflow process
publishDate 2000
url http://ndltd.ncl.edu.tw/handle/06023236914875758794
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