快速熱製程對矽化鈷的影響
碩士 === 國立清華大學 === 材料科學工程學系 === 88 === The refractory metal silicides have low sheet resistance, high thermal stability and self-aligned-silicide for IC process; they can reduce the steps with mask, resist and etching process. In recent, cobalt silicide (CoSi2) has been a subject of resear...
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| Format: | Others |
| Language: | zh-TW |
| Published: |
2000
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| Online Access: | http://ndltd.ncl.edu.tw/handle/93634594610963618724 |